Mortelmans K E, Stocker B A
Mol Gen Genet. 1979 Jan 2;167(3):317-27. doi: 10.1007/BF00267425.
Plasmid R46 (an R factor conferring resistance to ampicillin, sulfonamides, streptomycin and tetracycline) reduces the bactericidal effect of UV irradiation but increases its mutagenic effect (reversion of hisG46), and raises the frequency of spontaneous reversion (mutator effect). Putative deletion mutants of R46 were obtained by transduction of the plasmid, then two successive conjugal transfers. Plasmids of five of six deletion classes, each with a different combination of drug resistance traits, retained conjugative ability and the UV-protecting, mutagenesis-enhancing and mutator effects of R46. (pKM101, used in the Ames system to enhance responsiveness to chemical mutagens, is one such mutant of R46.) Plasmids of a sixth class, represented by pKM115, conferred resistance only to streptomycin and were non-conjugative. All of several such plasmids (of independent origin) had a much stronger mutator effect than did R46, but lacked UV-protecting ability and did not enhance the mutagenic effect of UV irradiation. We infer that R46 possesses: (i) a gene, uvp, which increases capacity for error-prone repair of UV-damaged DNA, and thus causes both UV protection and enhancement of UV mutagenesis; (ii) gene(s) whose action in the absence of gene uvp greatly increases the frequency of spontaneous reversion of hisG46. A plasmid of another incompatibility group, pLS51, has UV-protecting and mutagenesis-enhancing effect but lacks the mutator property; introduction of pLS51 into a clone of hisG46 carrying a pKM115-type plasmid greatly reduced its spontaneous reversion rate, as expected if pLS51 also has a uvp gene able to modulate the mutator effect of R46-derived gene(s) in the pKM115-type plasmid.
质粒R46(一种赋予对氨苄青霉素、磺胺类药物、链霉素和四环素抗性的R因子)降低了紫外线照射的杀菌效果,但增加了其诱变效果(hisG46的回复突变),并提高了自发回复突变的频率(诱变效应)。通过质粒转导,然后进行两次连续的接合转移,获得了R46的推定缺失突变体。六个缺失类中的五个类别的质粒,每个都具有不同的耐药性状组合,保留了接合能力以及R46的紫外线保护、诱变增强和诱变效应。(用于艾姆斯系统以增强对化学诱变剂反应性的pKM101就是R46的这样一种突变体。)以pKM115为代表的第六类质粒仅赋予对链霉素的抗性,并且是非接合性的。几种这样的质粒(独立起源)都具有比R46强得多的诱变效应,但缺乏紫外线保护能力,也不增强紫外线照射的诱变效应。我们推断R46具有:(i)一个uvp基因,它增加了对紫外线损伤DNA进行易错修复的能力,从而导致紫外线保护和紫外线诱变增强;(ii)在没有uvp基因的情况下其作用会大大增加hisG46自发回复突变频率的基因。另一个不相容群的质粒pLS51具有紫外线保护和诱变增强作用,但缺乏诱变特性;将pLS51导入携带pKM115型质粒的hisG46克隆中,如预期的那样,如果pLS51也具有一个能够调节pKM115型质粒中R46衍生基因诱变效应的uvp基因,其自发回复突变率会大大降低。