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通过光刻技术对量子点进行图案化:综述

Patterning Quantum Dots via Photolithography: A Review.

作者信息

Park Se Young, Lee Seongjae, Yang Jeehye, Kang Moon Sung

机构信息

Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, South Korea.

School of Chemical and Biological Engineering, Seoul National University, Seoul, 08826, South Korea.

出版信息

Adv Mater. 2023 Oct;35(41):e2300546. doi: 10.1002/adma.202300546. Epub 2023 Aug 2.

DOI:10.1002/adma.202300546
PMID:36892995
Abstract

Pixelating patterns of red, green, and blue quantum dots (QDs) is a critical challenge for realizing high-end displays with bright and vivid images for virtual, augmented, and mixed reality. Since QDs must be processed from a solution, their patterning process is completely different from the conventional techniques used in the organic light-emitting diode and liquid crystal display industries. Although innovative QD patterning technologies are being developed, photopatterning based on the light-induced chemical conversion of QD films is considered one of the most promising methods for forming micrometer-scale QD patterns that satisfy the precision and fidelity required for commercialization. Moreover, the practical impact will be significant as it directly exploits mature photolithography technologies and facilities that are widely available in the semiconductor industry. This article reviews recent progress in the effort to form QD patterns via photolithography. The review begins with a general description of the photolithography process. Subsequently, different types of photolithographical methods applicable to QD patterning are introduced, followed by recent achievements using these methods in forming high-resolution QD patterns. The paper also discusses prospects for future research directions.

摘要

对红色、绿色和蓝色量子点(QD)进行像素化图案处理,是实现用于虚拟现实、增强现实和混合现实的具有明亮生动图像的高端显示器的一项关键挑战。由于量子点必须从溶液中进行处理,其图案化过程与有机发光二极管和液晶显示器行业中使用的传统技术完全不同。尽管正在开发创新的量子点图案化技术,但基于量子点薄膜光诱导化学转化的光刻技术被认为是形成满足商业化所需精度和保真度的微米级量子点图案最有前途的方法之一。此外,由于它直接利用了半导体行业中广泛可用的成熟光刻技术和设施,其实际影响将是巨大的。本文综述了通过光刻技术形成量子点图案的最新进展。综述首先对光刻工艺进行了一般性描述。随后,介绍了适用于量子点图案化的不同类型光刻方法,接着阐述了使用这些方法在形成高分辨率量子点图案方面的最新成果。本文还讨论了未来研究方向的前景。

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