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原子层沉积法制备及改性膜:在水处理和气体分离中的工艺与应用

Membrane Fabrication and Modification by Atomic Layer Deposition: Processes and Applications in Water Treatment and Gas Separation.

作者信息

Behroozi Amir Hossein, Vatanpour Vahid, Meunier Louise, Mehrabi Mohammad, Koupaie Ehssan H

机构信息

Department of Chemical Engineering, Queen's University, Kingston K7L 3N6, Ontario, Canada.

Department of Applied Chemistry, Faculty of Chemistry, Kharazmi University, Tehran 15719-14911, Iran.

出版信息

ACS Appl Mater Interfaces. 2023 Mar 22;15(11):13825-13843. doi: 10.1021/acsami.2c22627. Epub 2023 Mar 10.

DOI:10.1021/acsami.2c22627
PMID:36898166
Abstract

Membrane-based separation processes are part of most water purification plants worldwide. Industrial separation applications, primarily water purification and gas separation, can be improved with novel membranes or modification to existing ones. Atomic layer deposition (ALD) is an emerging technique that is proposed to upgrade certain kinds of membranes independent of their chemistry and morphology. ALD deposits thin, defect-free, angstrom-scale, and uniform coating layers on a substrate's surface by reacting with gaseous precursors. The surface-modifying effects of ALD are described in the present review, followed by a description of various types of inorganic and organic barrier films and how these can be used in combination with ALD. The role of ALD in membrane fabrication and modification is categorized into different membrane-based groups according to the treated medium, i.e., water or gas. In all membrane types, the ALD-based direct deposition of inorganic materials, mainly metal oxides, on the membrane surface can improve antifouling, selectivity, permeability, and hydrophilicity. Therefore, the ALD technique can broaden the applications of membranes to the treatment of emerging contaminants in water and air. Finally, the advancement, limitations, and challenges of ALD-based membrane fabrication and modification are compared to provide a comprehensive guideline for developing next-generation membranes with improved filtration and separation performance.

摘要

基于膜的分离工艺是全球大多数水净化厂的一部分。工业分离应用,主要是水净化和气体分离,可以通过新型膜或对现有膜进行改性来改进。原子层沉积(ALD)是一种新兴技术,被提议用于升级某些类型的膜,而不考虑其化学性质和形态。ALD通过与气态前驱体反应,在基底表面沉积薄的、无缺陷的、埃级且均匀的涂层。本综述描述了ALD的表面改性效果,随后介绍了各种类型的无机和有机阻挡膜,以及它们如何与ALD结合使用。根据处理的介质,即水或气体,将ALD在膜制备和改性中的作用分类为不同的基于膜的组。在所有膜类型中,在膜表面基于ALD直接沉积无机材料,主要是金属氧化物,可以提高抗污染性、选择性、渗透性和亲水性。因此,ALD技术可以拓宽膜在水和空气中新兴污染物处理方面的应用。最后,比较了基于ALD的膜制备和改性的进展、局限性和挑战,为开发具有改进过滤和分离性能的下一代膜提供全面的指导。

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