采用原位合成-负载法制备 SnO-Pd 纳米粒子厚膜的气敏性能。

Gas Sensing Properties of SnO-Pd Nanoparticles Thick Film by Applying In Situ Synthesis-Loading Method.

机构信息

Department of Chemical and Biochemical Engineering, Dongguk University-Seoul, Seoul 04620, Republic of Korea.

Display Research Center, Korea Electronics Technology Institute, Seongnam 13509, Gyeonggi, Republic of Korea.

出版信息

Sensors (Basel). 2023 Feb 21;23(5):2404. doi: 10.3390/s23052404.

DOI:10.3390/s23052404

PMID:36904608

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10007030/

Abstract

In this study, SnO-Pd nanoparticles(NPs) were made with an in situ synthesis-loading method. The in situ method is to simultaneously load a catalytic element during the procedure to synthesize SnO NPs. SnO-Pd NPs were synthesized by using the in situ method and were heat-treated at 300 °C. As a result, tetragonal structured SnO-Pd NPs, having an ultrafine size of less than 10 nm and a uniformly distributed Pd catalyst in the SnO lattice, were well made and a gas sensitive thick film with a thickness of c.a. 40 μm was well fabricated by using the NPs. Gas sensing characterization for CH gas indicated that the gas sensitivity, R/R, of the thick film consistent with SnO-Pd NPs synthesized with the in situ synthesis-loading method, followed by heat-treatment at 500 °C, was enhanced to 0.59. Therefore, the in situ synthesis-loading method is available for synthesis of SnO-Pd NPs for gas sensitive thick film.

摘要

在这项研究中，采用原位合成-负载法制备了 SnO-Pd 纳米粒子（NPs）。原位法是指在合成 SnO NPs 的过程中同时负载催化元素。通过原位法合成了 SnO-Pd NPs，并在 300°C 下进行热处理。结果表明，成功制备了具有四方结构的 SnO-Pd NPs，其超小尺寸小于 10nm，Pd 催化剂在 SnO 晶格中均匀分布，并使用 NPs 制备了厚度约为 40μm 的气体敏感厚膜。对 CH 气体的气敏特性表明，经原位合成-负载法合成、500°C 热处理后的 SnO-Pd NPs 厚膜的气敏比 R/R 提高到 0.59。因此，原位合成-负载法可用于合成用于气体敏感厚膜的 SnO-Pd NPs。