Department of Electrical and Electronic Engineering, Tokyo Denki University, Senju Asahi-cho 5, Adachi-ku, Tokyo, 120-8551, Japan.
Department of Chemical Science and Engineering, Hosei University, Kajino-cho, Koganei-shi, Tokyo, 184-8584, Japan.
Nanotechnology. 2023 Apr 19;34(27). doi: 10.1088/1361-6528/acc8db.
Thin films of tantalum disulfide in the 1T-polytype structural phase (1T-TaS), a type of metallic two-dimensional (2D) transition metal dichalcogenides (TMDs), are reactive to H. Interestingly, in the incommensurate charge-density wave (ICCDW) phase with a metallic state, the electrical resistance of the 1T-TaSthin film decreases when His adsorbed on it and returns to its initial value upon desorption. In contrast, the electrical resistance of the film in the nearly commensurate CDW (NCCDW) phase, which has a subtle band overlap or a small bandgap, does not change upon Hadsorption/desorption. This difference in Hreactivity is a result of differences in the electronic structure of the two 1T-TaSphases, namely, the ICCDW and NCCDW phases. Compared to other semiconductor 2D-TMDs such as MoSand WS, the metallic TaShas been theoretically proven to capture gas molecules more easily because Ta has a stronger positive charge than Mo or W. Our experimental results provide evidence of this. Notably, this study is the first example of Hsensing using 1T-TaSthin films and demonstrates the possibility of controlling the reactivity of the sensors to the gas by changing the electronic structure via CDW phase transitions.
二硫化钽的 1T 型多型结构相(1T-TaS)的薄膜是一种金属二维(2D)过渡金属二硫属化物(TMD),对 H 具有反应活性。有趣的是,在具有金属态的非调谐电荷密度波(ICCDW)相中,当 H 吸附在其上时,1T-TaS 薄膜的电阻会降低,而在解吸时会恢复到初始值。相比之下,具有细微能带重叠或小能隙的近调谐 CDW(NCCDW)相的薄膜的电阻在 H 吸附/解吸时不会发生变化。这种 H 反应活性的差异是两种 1T-TaS 相,即 ICCDW 和 NCCDW 相的电子结构差异的结果。与其他半导体 2D-TMD 如 MoS 和 WS 相比,理论上已经证明金属 TaS 更容易捕获气体分子,因为 Ta 的正电荷比 Mo 或 W 更强。我们的实验结果提供了这方面的证据。值得注意的是,这项研究是首次使用 1T-TaS 薄膜进行 H 感应的实例,并证明了通过 CDW 相变改变电子结构来控制传感器对气体反应性的可能性。