Dey Aditya, Chowdhury Shoieb Ahmed, Peña Tara, Singh Sobhit, Wu Stephen M, Askari Hesam
Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627, United States.
Department of Electrical and Computer Engineering, University of Rochester, Rochester, New York 14627, United States.
ACS Appl Eng Mater. 2023 Mar 13;1(3):970-982. doi: 10.1021/acsaenm.2c00259. eCollection 2023 Mar 24.
Twisted bilayer graphene exhibits electronic properties strongly correlated with the size and arrangement of moiré patterns. While rigid rotation of the two graphene layers results in a moiré interference pattern, local rearrangements of atoms due to interlayer van der Waals interactions result in atomic reconstruction within the moiré cells. Manipulating these patterns by controlling the twist angle and externally applied strain provides a promising route to tuning their properties. Atomic reconstruction has been extensively studied for angles close to or smaller than the magic angle (θ = 1.1°). However, this effect has not been explored for applied strain and is believed to be negligible for high twist angles. Using interpretive and fundamental physical measurements, we use theoretical and numerical analyses to resolve atomic reconstruction in angles above θ . In addition, we propose a method to identify local regions within moiré cells and track their evolution with strain for a range of representative high twist angles. Our results show that atomic reconstruction is actively present beyond the magic angle, and its contribution to the moiré cell evolution is significant. Our theoretical method to correlate local and global phonon behavior further validates the role of reconstruction at higher angles. Our findings provide a better understanding of moiré reconstruction in large twist angles and the evolution of moiré cells under the application of strain, which might be potentially crucial for twistronics-based applications.
扭曲双层石墨烯展现出与莫尔条纹图案的尺寸和排列密切相关的电子特性。虽然两层石墨烯的刚性旋转会产生莫尔干涉图案,但由于层间范德华相互作用导致的原子局部重排会在莫尔晶胞内引发原子重构。通过控制扭曲角和外部施加的应变来操纵这些图案,为调节其特性提供了一条很有前景的途径。对于接近或小于魔角(θ = 1.1°)的角度,原子重构已得到广泛研究。然而,对于施加应变的情况,这种效应尚未被探索,并且人们认为对于高扭曲角来说可以忽略不计。利用解释性和基础性的物理测量,我们运用理论和数值分析来解析高于θ的角度下的原子重构。此外,我们提出了一种方法,用于识别莫尔晶胞内的局部区域,并跟踪一系列具有代表性的高扭曲角下它们随应变的演化。我们的结果表明,原子重构在超过魔角时依然存在,并且它对莫尔晶胞演化的贡献是显著的。我们将局部和全局声子行为相关联的理论方法进一步验证了在更高角度下重构的作用。我们的发现有助于更好地理解大扭曲角下的莫尔重构以及在应变作用下莫尔晶胞的演化,这对于基于扭曲电子学的应用可能至关重要。