Department of Physics, Beijing Normal, University, Beijing, 100875, China.
LCP, Inst Appl Phys & Computation Math, Beijing 100088, China.
Nanoscale. 2023 May 4;15(17):7792-7802. doi: 10.1039/d3nr00477e.
Twisted bilayer (tB) transition metal dichalcogenide (TMD) structures formed from two pieces of a periodic pattern overlaid with a relative twist manifest novel electronic and optical properties and correlated electronic phenomena. Here, twisted flower-like MoS and MoSe bilayers were artificially fabricated by the chemical vapor deposition (CVD) method. Photoluminescence (PL) studies demonstrated that an energy band structural transition from the indirect gap to the direct gap happened in the region away from the flower center in tB MoS (MoSe) flower patterns, accompanied by an enhanced PL intensity. The indirect-to-direct-gap transition in the tB-MoS (MoSe) flower dominantly originated from a gradually enlarged interlayer spacing and thus, interlayer decoupling during the spiral growth of tB flower patterns. Meanwhile, the expanded interlayer spacing resulted in a decreased effective mass of the electrons. This means that the charged exciton (trion) population was reduced and the neutral exciton density was increased to obtain the upgraded PL intensity in the off-center region. Our experimental results were further evidenced by the density functional theory (DFT) calculations of the energy band structures and the effective masses of electrons and holes for the artificial tB-MoS flower with different interlayer spacings. The single-layer behavior of tB flower-like homobilayers provided a viable route to finely manipulate the energy band gap and the corresponding exotic optical properties by locally tuning the stacked structures and to satisfy the real requirement in TMD-based optoelectronic devices.
扭曲双层(tB)过渡金属二硫属化物(TMD)结构由两块周期性图案叠加相对扭转而成,表现出新颖的电子和光学性质以及相关的电子现象。在这里,通过化学气相沉积(CVD)方法人工制备了扭曲的花状 MoS 和 MoSe 双层。光致发光(PL)研究表明,在远离 tB MoS(MoSe)花型中心的区域,从间接带隙到直接带隙的能带结构发生了转变,同时 PL 强度增强。tB-MoS(MoSe)花中的间接到直接带隙转变主要源于螺旋生长过程中逐渐增大的层间距以及因此产生的层间解耦。同时,扩展的层间距导致电子的有效质量减小。这意味着带电激子(三激子)的数量减少,中性激子的密度增加,从而在非中心区域获得了增强的 PL 强度。我们的实验结果进一步通过不同层间距的人工 tB-MoS 花的能带结构和电子空穴有效质量的密度泛函理论(DFT)计算得到证实。tB 花状同层双层的单层行为为通过局部调整堆叠结构精细地控制能带隙和相应的奇异光学性质提供了一种可行的途径,并满足了基于 TMD 的光电设备的实际要求。