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气溶胶辅助化学气相沉积法制备的硫化亚锡薄膜的热电性能增强

Enhanced Thermoelectric Performance of Tin(II) Sulfide Thin Films Prepared by Aerosol Assisted Chemical Vapor Deposition.

作者信息

Liu Yu, McNaughter Paul D, Azough Feridoon, Liu Xiaodong, Skelton Jonathan M, Kretinin Andrey V, Lewis David J, Freer Robert

机构信息

Department of Materials, University of Manchester, Oxford Road, Manchester, M13 9PL, U.K.

Department of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL, U.K.

出版信息

ACS Appl Energy Mater. 2023 Apr 3;6(8):4462-4474. doi: 10.1021/acsaem.3c00608. eCollection 2023 Apr 24.

Abstract

Orthorhombic SnS exhibits excellent thermoelectric performance as a consequence its relatively high Seebeck coefficient and low thermal conductivity. In the present work, polycrystalline orthorhombic SnS thin films were prepared by aerosol-assisted chemical vapor deposition (AACVD) using the single source precursor dibutyl-(diethyldithiocarbamato)tin(IV) [Sn(CH)(SCN(CH))]. We examined the effects of the processing parameters on the composition, microstructure, and electrical transport properties of the SnS films. Deposition temperature dominates charge transport; the room temperature electrical conductivity increased from 0.003 to 0.19 S·cm as deposition temperature increased from 375 to 445 °C. Similarly, the maximum power factor (PF) increased with deposition temperature, reaching ∼0.22 μW·cm·K at 570 K. The power factors for SnS films deposited by AACVD are higher than values from earlier work on SnS bulks and SnS/SnSe films at temperatures up to 520 K. The electronic structure and electrical transport properties of SnS were investigated using density-functional theory to provide an improved understanding of the materials performance. To the best of our knowledge, the thermal conductivity (κ) of SnS film was measured for the first time allowing the figure of merit () for SnS film to be evaluated. A relatively low thermal conductivity of ∼0.41 W·m·K was obtained at 550 K for SnS films deposited at 445 °C; the corresponding value was ∼0.026. The SnS films are good candidates for thermoelectric applications and AACVD is a promising technique for the preparation of high-performance thermoelectric films.

摘要

正交晶系的SnS由于其相对较高的塞贝克系数和较低的热导率而表现出优异的热电性能。在本工作中,使用单源前驱体二丁基-(二乙基二硫代氨基甲酸)锡(IV)[Sn(CH)(SCN(CH))],通过气溶胶辅助化学气相沉积(AACVD)制备了多晶正交晶系SnS薄膜。我们研究了工艺参数对SnS薄膜的组成、微观结构和电输运性能的影响。沉积温度主导电荷输运;随着沉积温度从375℃升高到445℃,室温电导率从0.003 S·cm增加到0.19 S·cm。同样,最大功率因子(PF)随着沉积温度的升高而增加,在570 K时达到约0.22 μW·cm·K。在高达520 K的温度下,通过AACVD沉积的SnS薄膜的功率因子高于早期关于SnS块体和SnS/SnSe薄膜的工作值。利用密度泛函理论研究了SnS的电子结构和电输运性能,以更好地理解材料性能。据我们所知,首次测量了SnS薄膜的热导率(κ),从而能够评估SnS薄膜的优值()。对于在445℃沉积的SnS薄膜,在550 K时获得了相对较低的热导率约0.41 W·m·K;相应的优值约为0.026。SnS薄膜是热电应用的良好候选材料,AACVD是制备高性能热电薄膜的一种有前途的技术。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7375/10131136/4fa81c97a764/ae3c00608_0001.jpg

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