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具有受控拓扑结构的分级 UiO-66(-NH)/CuInS S-Scheme 光催化剂,用于增强光催化 N2 固定和 HO 生成。

Hierarchical UiO-66(-NH)/CuInS S-Scheme Photocatalyst with Controlled Topology for Enhanced Photocatalytic N Fixation and HO Production.

机构信息

Department of Chemistry, National Institute of Technology, Rourkela 769008, Odisha India.

出版信息

Langmuir. 2023 Jun 6;39(22):7707-7722. doi: 10.1021/acs.langmuir.3c00519. Epub 2023 May 22.

DOI:10.1021/acs.langmuir.3c00519
PMID:37212348
Abstract

The fabrication of defect rich S-scheme binary heterojunction system with enhanced space charge separation and mobilization is a pioneering approach for improving photoreduction efficiency towards the production of value added chemicals. Herein, we have rationally fabricated an atomic sulfur defect-rich hierarchical UiO-66(-NH)/CuInS n-p heterojunction system by uniform dispersion of UiO-66(-NH) (UN66) nanoparticles over the surface of hierarchical CuInS nanosheets under mild conditions. The designed heterostructures are characterized by using different structural, microscopic, and spectroscopic techniques. The hierarchical CuInS (CIS) component shows surface sulfur defects leading to creation of more surface exposed active sites with improved absorption of visible light and augmented diffusion of charge carriers. The photocatalytic performance of prepared UiO-66(-NH)/CuInS heterojunction materials is explored for N fixation and O reduction reactions (ORR). The optimal UN66/CIS20 heterostructure photocatalyst exhibited outstanding N fixation and O reduction performances with yields of 398 and 4073 μmol g h under visible light illumination, respectively. An S-scheme charge migration pathway coupled with improved radical generation ability accounted for the superior N fixation and HO production activity. This research work furnishes a new perspective on the synergistic effect of atomic vacancy and an S-scheme heterojunction system toward enhanced photocatalytic NH and HO production using a vacancy-rich hierarchical heterojunction photocatalyst.

摘要

具有增强的空间电荷分离和迁移的缺陷富 S 型二元异质结系统的制造是提高光还原效率以生产增值化学品的开创性方法。在此,我们通过在温和条件下将 UN66 纳米颗粒均匀分散在分级 CuInS 纳米片的表面上,合理地制备了原子硫缺陷丰富的分级 UiO-66(-NH)/CuInS n-p 异质结系统。通过使用不同的结构、微观和光谱技术对设计的异质结构进行了表征。分层的 CuInS (CIS) 组分具有表面硫缺陷,从而产生更多的表面暴露的活性位,提高了可见光的吸收和载流子的扩散。研究了制备的 UiO-66(-NH)/CuInS 异质结材料在 N 固定和 O 还原反应 (ORR) 中的光催化性能。最佳的 UN66/CIS20 异质结构光催化剂在可见光照射下分别表现出 398 和 4073 μmol g h 的出色 N 固定和 O 还原性能。S 型电荷迁移途径与增强的自由基生成能力相结合,解释了其在 N 固定和 HO 生成活性方面的优越性能。这项研究工作为利用富含空位的分级异质结光催化剂通过原子空位和 S 型异质结系统的协同效应来增强光催化 NH 和 HO 生成提供了新的视角。

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