• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

用于40纳米以下结构光学3D光刻的低荧光起始剂

Low-Fluorescence Starter for Optical 3D Lithography of Sub-40 nm Structures.

作者信息

Gvindzhiliia Georgii, Sivun Dmitry, Naderer Christoph, Jacak Jaroslaw, Klar Thomas A

机构信息

Institute of Applied Physics, Johannes Kepler University Linz, 4040 Linz, Austria.

Department of Medical Engineering, University of Applied Sciences Upper Austria, 4020 Linz, Austria.

出版信息

ACS Appl Opt Mater. 2023 May 12;1(5):945-951. doi: 10.1021/acsaom.3c00031. eCollection 2023 May 26.

DOI:10.1021/acsaom.3c00031
PMID:37255503
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10226181/
Abstract

Stimulated emission depletion (STED) has been used to break the diffraction limit in fluorescence microscopy. Inspired by this success, similar methods were used to reduce the structure size in three-dimensional, subdiffractional optical lithography. So far, only a very limited number of radical polymerization starters proved to be suitable for STED-inspired lithography. In this contribution, we introduce the starter Michler's ethyl ketone (MEK), which has not been used so far for STED-inspired lithography. In contrast to the commonly used 7-diethylamino-3-thenoylcoumarin (DETC), nanostructures written with MEK show low autofluorescence in the visible range. Therefore, MEK is promising for being used as a starter for protein or cell scaffolds in physiological research because the autofluorescence of DETC so far excluded the use of the green emission channel in multicolor fluorescence or confocal microscopy. In turn, because of the weak transitions of MEK in the visible spectrum, STED, in its original sense, cannot be applied to deplete MEK in the outer rim of the point spread function. However, a 660 nm laser can be used for depletion because this wavelength is well within the absorption spectrum of transient states, possibly of triplet states. We show that polymerization can be fully stopped by applying transient state absorption at 660 nm and that structure sizes down to approx. 40 nm in the lateral and axial directions can be achieved, which means 1/20 of the optical wavelength used for writing.

摘要

受激辐射损耗(STED)已被用于突破荧光显微镜中的衍射极限。受此成功启发,类似方法被用于三维亚衍射光学光刻中以减小结构尺寸。到目前为止,仅有极少数自由基聚合引发剂被证明适用于受STED启发的光刻。在本论文中,我们介绍了米氏乙基酮(MEK)引发剂,它迄今尚未用于受STED启发的光刻。与常用的7 - 二乙氨基 - 3 - 噻吩甲酰基香豆素(DETC)相比,用MEK写入的纳米结构在可见光范围内显示出低自发荧光。因此,MEK有望用作生理研究中蛋白质或细胞支架的引发剂,因为迄今为止DETC的自发荧光排除了在多色荧光或共聚焦显微镜中使用绿色发射通道。反过来,由于MEK在可见光谱中的跃迁较弱,从其原始意义上讲,STED不能用于耗尽点扩散函数外缘的MEK。然而,660 nm激光可用于耗尽,因为该波长恰好在瞬态(可能是三重态)的吸收光谱范围内。我们表明,通过施加660 nm的瞬态吸收可以完全停止聚合反应,并且在横向和轴向上可以实现低至约40 nm的结构尺寸,这意味着是用于写入的光波长的1/20。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/72097d491547/ot3c00031_0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/b250cd646c1b/ot3c00031_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/68ebafabadac/ot3c00031_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/873fedd1a123/ot3c00031_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/1f6503a319cb/ot3c00031_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/201ce3c26055/ot3c00031_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/72097d491547/ot3c00031_0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/b250cd646c1b/ot3c00031_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/68ebafabadac/ot3c00031_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/873fedd1a123/ot3c00031_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/1f6503a319cb/ot3c00031_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/201ce3c26055/ot3c00031_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6423/10226181/72097d491547/ot3c00031_0007.jpg

相似文献

1
Low-Fluorescence Starter for Optical 3D Lithography of Sub-40 nm Structures.用于40纳米以下结构光学3D光刻的低荧光起始剂
ACS Appl Opt Mater. 2023 May 12;1(5):945-951. doi: 10.1021/acsaom.3c00031. eCollection 2023 May 26.
2
STED lithography and protein nanoanchors受激发射损耗光刻技术与蛋白质纳米锚定物
3
120 nm resolution and 55 nm structure size in STED-lithography.受激发射损耗光刻中的120纳米分辨率和55纳米结构尺寸。
Opt Express. 2013 May 6;21(9):10831-40. doi: 10.1364/OE.21.010831.
4
STED-Inspired Cationic Photoinhibition Lithography.受受激发射损耗(STED)启发的阳离子光抑制光刻技术
J Phys Chem C Nanomater Interfaces. 2023 Sep 7;127(37):18736-18744. doi: 10.1021/acs.jpcc.3c04394. eCollection 2023 Sep 21.
5
Pump-probe spectroscopy on photoinitiators for stimulated-emission-depletion optical lithography.用于受激发射损耗光致刻蚀的光引发剂的泵浦探测光谱学。
Opt Lett. 2011 Aug 15;36(16):3188-90. doi: 10.1364/OL.36.003188.
6
Molecular Switch for Sub-Diffraction Laser Lithography by Photoenol Intermediate-State Cis-Trans Isomerization.光烯醇中间体顺反异构的分子开关用于亚衍射激光光刻。
ACS Nano. 2017 Jun 27;11(6):6396-6403. doi: 10.1021/acsnano.7b02820. Epub 2017 Jun 8.
7
Stimulated Emission Depletion Inspired Sub-100 nm Structuring of Epoxides Using 2-Chlorothioxanthone as Photosensitizer.以2-氯噻吨酮为光敏剂,受受激辐射损耗启发的亚100纳米环氧化合物结构化
ACS Omega. 2024 Apr 18;9(17):19203-19208. doi: 10.1021/acsomega.4c00031. eCollection 2024 Apr 30.
8
Biofunctionalization of Sub-Diffractionally Patterned Polymer Structures by Photobleaching.亚衍射图案化聚合物结构的光漂白生物功能化。
ACS Appl Mater Interfaces. 2018 Sep 26;10(38):31850-31854. doi: 10.1021/acsami.8b11777. Epub 2018 Sep 14.
9
Ultralow Laser Power Three-Dimensional Superresolution Microscopy Based on Digitally Enhanced STED.基于数字增强 STED 的超低激光功率三维超分辨显微镜。
Biosensors (Basel). 2022 Jul 20;12(7):539. doi: 10.3390/bios12070539.
10
STED lithography in microfluidics for 3D thrombocyte aggregation testing.微流控中的受激发射损耗(STED)光刻用于 3D 血小板聚集测试。
J Nanobiotechnology. 2021 Jan 18;19(1):23. doi: 10.1186/s12951-020-00762-8.

引用本文的文献

1
Stimulated Emission Depletion Inspired Sub-100 nm Structuring of Epoxides Using 2-Chlorothioxanthone as Photosensitizer.以2-氯噻吨酮为光敏剂,受受激辐射损耗启发的亚100纳米环氧化合物结构化
ACS Omega. 2024 Apr 18;9(17):19203-19208. doi: 10.1021/acsomega.4c00031. eCollection 2024 Apr 30.
2
STED-Inspired Cationic Photoinhibition Lithography.受受激发射损耗(STED)启发的阳离子光抑制光刻技术
J Phys Chem C Nanomater Interfaces. 2023 Sep 7;127(37):18736-18744. doi: 10.1021/acs.jpcc.3c04394. eCollection 2023 Sep 21.

本文引用的文献

1
Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer.用于光抑制双光子光刻的浸入式光刻胶,以实现晶圆上的高精度直接激光写入
ACS Appl Mater Interfaces. 2022 Jul 13;14(27):31332-31342. doi: 10.1021/acsami.2c08063. Epub 2022 Jul 4.
2
Elucidating complex triplet-state dynamics in the model system isopropylthioxanthone.阐明模型体系异丙基硫代呫吨酮中复杂的三重态动力学。
iScience. 2021 Dec 9;25(1):103600. doi: 10.1016/j.isci.2021.103600. eCollection 2022 Jan 21.
3
STED lithography in microfluidics for 3D thrombocyte aggregation testing.
微流控中的受激发射损耗(STED)光刻用于 3D 血小板聚集测试。
J Nanobiotechnology. 2021 Jan 18;19(1):23. doi: 10.1186/s12951-020-00762-8.
4
STED Direct Laser Writing of 45 nm Width Nanowire.受激发射损耗显微镜直接激光写入45纳米宽度的纳米线。
Micromachines (Basel). 2019 Oct 28;10(11):726. doi: 10.3390/mi10110726.
5
Localization Microscopy of Actin Cytoskeleton in Human Platelets.人血小板肌动蛋白细胞骨架的定位显微镜观察。
Int J Mol Sci. 2018 Apr 11;19(4):1150. doi: 10.3390/ijms19041150.
6
Nano-anchors with single protein capacity produced with STED lithography.采用 STED 光刻技术制备的具有单蛋白容量的纳米锚。
Nano Lett. 2013;13(11):5672-8. doi: 10.1021/nl4033523. Epub 2013 Oct 16.
7
120 nm resolution and 55 nm structure size in STED-lithography.受激发射损耗光刻中的120纳米分辨率和55纳米结构尺寸。
Opt Express. 2013 May 6;21(9):10831-40. doi: 10.1364/OE.21.010831.
8
Polymerization inhibition by triplet state absorption for nanoscale lithography.用于纳米光刻的三重态吸收引发的聚合抑制
Adv Mater. 2013 Feb 13;25(6):904-9. doi: 10.1002/adma.201204141. Epub 2013 Jan 9.
9
Photopolymerization inhibition dynamics for sub-diffraction direct laser writing lithography.亚衍射极限直接激光写入光刻的光聚合抑制动力学。
Chemphyschem. 2012 Apr 23;13(6):1429-34. doi: 10.1002/cphc.201200006. Epub 2012 Mar 5.
10
Ultrafast polymerization inhibition by stimulated emission depletion for three-dimensional nanolithography.受激辐射损耗超快聚合抑制用于三维纳米光刻。
Adv Mater. 2012 Mar 8;24(10):OP65-9. doi: 10.1002/adma.201103758. Epub 2012 Feb 10.