Tromp Rudolf M, Hannon James B, Dyck Meredith L
IBM T.J. Watson Research Center, 1101 Kitchawan Road, Yorktown Heights, NY 10598, United States.
IBM T.J. Watson Research Center, 1101 Kitchawan Road, Yorktown Heights, NY 10598, United States.
Ultramicroscopy. 2023 Nov;253:113798. doi: 10.1016/j.ultramic.2023.113798. Epub 2023 Jun 20.
In a Low Energy Electron Microscope (LEEM) the sample is illuminated with an electron beam with typical electron landing energies from 0-100 eV. The energy spread of the electron beam is determined by the characteristics of the electron source. For the two most commonly used electron sources, LaB and cold field emission W, typical energy spreads ΔE are 0.75 and 0.25 eV at full width half maximum, respectively. Here we present a design for a LEEM gun energy filter, that reduces ΔE to ∼100 meV. Such a filter has been incorporated in the IBM/SPECS AC-LEEM system at IBM. Experimental results are presented and found to be in excellent agreement with expectations.
在低能电子显微镜（LEEM）中，样品由具有0 - 100电子伏特典型电子着陆能量的电子束照射。电子束的能量展宽由电子源的特性决定。对于两种最常用的电子源，即LaB和冷场发射钨，在半高宽处的典型能量展宽ΔE分别为0.75电子伏特和0.25电子伏特。在此，我们展示了一种用于LEEM枪能量过滤器的设计，它可将ΔE降低至约100毫电子伏特。这样的过滤器已被纳入IBM的IBM/SPECS AC - LEEM系统中。文中给出了实验结果，发现与预期非常吻合。
