Khan Habibullah, Islam Md Monirul, Roya Rajnin Imran, Azad Sariha Noor, Alam Mahbub
Department of Electrical and Electronic Engineering, Bangladesh University of Engineering and Technology, Dhaka 1000, Bangladesh.
Micromachines (Basel). 2023 Jul 6;14(7):1385. doi: 10.3390/mi14071385.
Graphyne has attractive electronic properties that make it a possible replacement of silicon in FET technology. In FET technology, the goal is to achieve low power dissipation and lower subthreshold swing. In this study, we focused on achieving these goals and studied the electronic properties of α-graphyne nanoribbons. We simulated the transfer and output characteristics of an α-graphyne ballistic nanoribbon FET. We used the tight-binding model with nearest-neighbor approximation to obtain the band structure which gives the same band structure as the one found from the DFT. In order to simulate the I-V characteristics of the transistor we used the non-equilibrium Green's function (NEGF) formalism. The results show that the modeled FET can provide a high Ion/Ioff ratio and low subthreshold swing. We also studied the effects of defects as defects cannot be avoided in any practical device. The study shows that the Ion/Ioff ratio and subthreshold swing improves as defects are added, but the delay time and dynamic power dissipation worsen.
石墨炔具有吸引人的电子特性,这使其有可能在场效应晶体管(FET)技术中替代硅。在FET技术中,目标是实现低功耗和更低的亚阈值摆幅。在本研究中,我们专注于实现这些目标,并研究了α-石墨炔纳米带的电子特性。我们模拟了α-石墨炔弹道纳米带FET的转移和输出特性。我们使用最近邻近似的紧束缚模型来获得能带结构,该能带结构与从密度泛函理论(DFT)得到的能带结构相同。为了模拟晶体管的电流-电压(I-V)特性,我们使用了非平衡格林函数(NEGF)形式。结果表明,所建模的FET可以提供高的开态电流与关态电流之比(Ion/Ioff)和低的亚阈值摆幅。我们还研究了缺陷的影响,因为在任何实际器件中都无法避免缺陷。研究表明,随着缺陷的增加,Ion/Ioff和亚阈值摆幅会改善,但延迟时间和动态功耗会变差。