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比较有机和金属有机晶体中分子间卤素...卤素距离。

Comparison of Intermolecular Halogen...Halogen Distances in Organic and Organometallic Crystals.

机构信息

Chemistry Department, Moscow M. V. Lomonosov State University, 119991 Moscow, Russia.

出版信息

Int J Mol Sci. 2023 Jul 25;24(15):11911. doi: 10.3390/ijms241511911.

Abstract

Statistical analysis of halogen...halogen intermolecular distances was performed for three sets of homomolecular crystals under normal conditions: C-Hal1...Hal2-C distances in crystals consisting of: (i) organic compounds (set Org); (ii) organometallic compounds (set Orgmet); and (iii) distances M1-Hal1...Hal2-M2 (set MHal) (in all cases Hal1 = Hal2, and in MHal M1 = M2, M is any metal). When analyzing C-Hal...Hal-C distances, a new method for estimating the values of van der Waals radii is proposed, based on the use of two subsets of distances: (i) the shortest distances from each substance less than a threshold; and (ii) all C-Hal...Hal-C distances less than the same threshold. As initial approximations for these thresholds for different Hal, the values previously introduced in investigations with the participation of the author were used ( values make it possible to perform a statistical assessment of the presence of halogen aggregates in crystals). The following values are recommended in this work to be used as universal values for crystals of organic and organometallic compounds: = 1.57, = 1.90, = 1.99, and = 2.15 Å. They are in excellent agreement with the results of some other works but significantly (by 0.10-0.17 Å) greater than the commonly used values. For the Orgmet set, slightly lower values for (2.11-2.09 Å) were obtained, but number of the C-I...I-C distances available for analysis was significantly smaller than in the other subgroups, which may be the reason for the discrepancy with value for the Org set (2.15 Å). Statistical analysis of the M-Hal...Hal-M distances was performed for the first time. A Hal-aggregation coefficient for M-Hal bonds is proposed, which allows one to estimate the propensity of M-Hal groups with certain M and Hal to participate in Hal-aggregates formed by M-Hal...Hal-M contacts. In particular, it was found that, for the Hg-Hal groups (Hal = Cl, Br, I), there is a high probability that the crystals have Hg-Hal...Hal-Hg distances with length ≤ .

摘要

对三组在常温条件下的同分子晶体的卤...卤分子间距离进行了统计分析:(i)由有机化合物组成的晶体中的 C-Hal1...Hal2-C 距离(集 Org);(ii)由有机金属化合物组成的晶体中的 C-Hal1...Hal2-C 距离(集 Orgmet);以及(iii)晶体中 M1-Hal1...Hal2-M2 的 M-Hal...Hal-M 距离(在所有情况下 Hal1 = Hal2,并且在 MHal 中 M1 = M2,M 是任何金属)。在分析 C-Hal...Hal-C 距离时,提出了一种新的估计范德华半径值的方法,该方法基于使用两个距离子集:(i)每种物质中小于阈值的最短距离;以及(ii)所有小于相同阈值的 C-Hal...Hal-C 距离。对于不同的 Hal,作为这些阈值的初始近似值,使用了作者参与的先前研究中引入的 值( 值可用于统计评估晶体中卤化物聚集物的存在)。在这项工作中,建议使用以下值作为有机和有机金属化合物晶体的通用值: = 1.57, = 1.90, = 1.99,和 = 2.15 Å。它们与其他一些工作的结果非常吻合,但比常用值显著(0.10-0.17 Å)高。对于 Orgmet 集,获得了稍微较低的值 (2.11-2.09 Å),但可用于分析的 C-I...I-C 距离数量明显小于其他子组,这可能是与 Org 集值(2.15 Å)不一致的原因。首次对 M-Hal...Hal-M 距离进行了统计分析。提出了 M-Hal 键的卤聚合系数,该系数可用于估计具有特定 M 和 Hal 的 M-Hal 基团参与由 M-Hal...Hal-M 接触形成的 Hal 聚合体的倾向。特别是,发现对于 Hg-Hal 基团(Hal = Cl、Br、I),晶体很可能具有长度≤ 的 Hg-Hal...Hal-Hg 距离。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f4fb/10419058/b6bea51b21ef/ijms-24-11911-g001a.jpg

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