Xia Xinyi, Chiang Chao-Ching, Gopalakrishnan Sarathy K, Kulkarni Aniruddha V, Ren Fan, Ziegler Kirk J, Esquivel-Upshaw Josephine F
Department of Chemical Engineering, College of Engineering, University of Florida, Gainesville, FL 32611, USA.
Department of Restorative Dental Sciences, Division of Prosthodontics, College of Dentistry, University of Florida, Gainesville, FL 32610, USA.
Materials (Basel). 2023 Jul 28;16(15):5318. doi: 10.3390/ma16155318.
The application of surface coatings is a popular technique to improve the performance of materials used for medical and dental implants. Ternary silicon carbon nitride (SiCN), obtained by introducing nitrogen into SiC, has attracted significant interest due to its potential advantages. This study investigated the properties of SiCN films deposited via PECVD for dental implant coatings. Chemical composition, optical, and tribological properties were analyzed by adjusting the gas flow rates of NH, CH, and SiH. The results indicated that an increase in the NH flow rate led to higher deposition rates, scaling from 5.7 nm/min at an NH flow rate of 2 sccm to 7 nm/min at an NH flow rate of 8 sccm. Concurrently, the formation of N-Si bonds was observed. The films with a higher nitrogen content exhibited lower refractive indices, diminishing from 2.5 to 2.3 as the NH flow rate increased from 2 sccm to 8 sccm. The contact angle of SiCN films had minimal differences, while the corrosion rate was dependent on the pH of the environment. These findings contribute to a better understanding of the properties and potential applications of SiCN films for use in dental implants.
表面涂层的应用是一种提高用于医学和牙科植入物材料性能的常用技术。通过将氮引入碳化硅(SiC)中获得的三元碳氮化硅(SiCN),因其潜在优势而引起了广泛关注。本研究调查了通过等离子体增强化学气相沉积(PECVD)法沉积的用于牙科植入物涂层的SiCN薄膜的性能。通过调整NH₃、CH₄和SiH₄的气体流速,对其化学成分、光学和摩擦学性能进行了分析。结果表明,NH₃流速的增加导致更高的沉积速率,从NH₃流速为2 sccm时的5.7 nm/min增加到NH₃流速为8 sccm时的7 nm/min。同时,观察到N-Si键的形成。氮含量较高的薄膜表现出较低的折射率,随着NH₃流速从2 sccm增加到8 sccm,折射率从2.5降低到2.3。SiCN薄膜的接触角差异最小,而腐蚀速率取决于环境的pH值。这些发现有助于更好地理解SiCN薄膜在牙科植入物中的性能和潜在应用。