Blumenstein Andreas, Simon Peter, Ihlemann Jürgen
Institut für Nanophotonik Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, Germany.
Nanomaterials (Basel). 2023 Aug 3;13(15):2240. doi: 10.3390/nano13152240.
The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed.
展示了通过紫外飞秒脉冲辐照对硅表面进行激光干涉图案化，从而产生350 nm周期性结构。结构化过程是使用脉冲持续时间为450 fs、波长为248 nm的激光结合掩膜投影装置进行的。根据激光能量密度，单脉冲辐照会导致非晶化、通过横向熔体流动形成结构或通过特殊的熔体聚结形成空隙。通过多脉冲辐照，可以观察到干涉结构和激光诱导周期性表面结构（LIPSS）的组合图案。
