Charlton Deborah, Costa Catia, Hinder Steven J, Watts John F, Bailey Melanie J
Department of Chemistry, University of Surrey, Guildford GU2 7XH, Surrey, UK.
Fingerprint Development Laboratory, Thames Valley Police, Kidlington OX5 2NX, Oxfordshire, UK.
Molecules. 2023 Jul 27;28(15):5687. doi: 10.3390/molecules28155687.
Time-of-flight secondary ion mass spectrometry (ToF-SIMS) has been shown to enhance fingermark recovery compared to standard processes used by police forces, but there is no data to show how generally applicable the improvement is. Additionally, ToF-SIMS can be run in either positive or negative ion mode (or both), and there is no data on which mode of operation is most effective at revealing fingerprints. This study aims to fill these gaps by using ToF-SIMS to image fingerprints deposited on two common exhibit-type surfaces (polyethylene and stainless steel) using 10 donors and ageing fingerprints in either ambient, rainwater, or underground for 1 and 5 months. In all, 120 fingerprints were imaged using ToF-SIMS, and each was run in positive and negative modes. A fingerprint expert compared the fingerprint ridge detail produced by the standard process to the ToF-SIMS images. In over 50% of the samples, ToF-SIMS was shown to improve fingerprint ridge detail visualised by the respective standard process for all surfaces tested. In over 90% of the samples, the ridge detail produced by ToF-SIMS was equivalent to standard development across all different ageing and exposure conditions. The data shows that there is a benefit to running the ToF-SIMS in both positive and negative modes, even if no ridge detail was seen in one mode.
与警方使用的标准方法相比,飞行时间二次离子质谱法(ToF-SIMS)已被证明能提高指纹恢复率,但尚无数据表明这种改进的普遍适用性如何。此外,ToF-SIMS可以在正离子模式或负离子模式(或两者)下运行,且没有关于哪种操作模式在揭示指纹方面最有效的数据。本研究旨在填补这些空白,通过使用ToF-SIMS对沉积在两种常见展品类型表面(聚乙烯和不锈钢)上的指纹进行成像,使用10名捐赠者的指纹,并将其在环境、雨水或地下环境中老化1个月和5个月。总共使用ToF-SIMS对120个指纹进行了成像,每个指纹都在正模式和负模式下运行。一名指纹专家将标准方法产生的指纹纹路细节与ToF-SIMS图像进行了比较。在超过50%的样本中,对于所有测试表面,ToF-SIMS被证明能改善通过各自标准方法可视化的指纹纹路细节。在超过90%的样本中,ToF-SIMS产生的纹路细节在所有不同的老化和暴露条件下都与标准显影相当。数据表明,即使在一种模式下未看到纹路细节,在正模式和负模式下运行ToF-SIMS也是有益的。