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氮掺杂氧化铜中电荷弛豫与复合的从头算时域研究

Ab Initio Time-Domain Study of Charge Relaxation and Recombination in N-Doped CuO.

作者信息

Su Jianfeng, Zhang Jiao, Wang Yajie, Wang Changqing, Niu Qiang, Sun Ruirui, Zhang Weiying

机构信息

Department of Mathematics and Physics, Luoyang Institute of Science and Technology, Luoyang 471023, China.

School of Physics and Electronic Information, Luoyang Normal University, Luoyang 471022, China.

出版信息

ACS Omega. 2023 Jul 27;8(31):28846-28850. doi: 10.1021/acsomega.3c03916. eCollection 2023 Aug 8.

Abstract

CuO is a good photoelectric material with excellent performance, and its crystal structure, electronic structure, and optical properties have been extensively studied. To further illustrate the charge distribution and the carrier transport in this system, the e-h recombination dynamics was studied. It is found that N doping induced a shallower impurity band above the VBM, leading to significant charge localization around the impurity atom. NAMD simulation reveals that the N doping system possesses a longer e-h nonradiative recombination time scale. Therefore, we demonstrate that the formation of the impurity band and charge localization play an essential role in suppressing e-h recombination in N doping systems. This work is conducive for understanding the carrier transport mechanism in N-doped CuO.

摘要

氧化铜是一种具有优异性能的良好光电材料,其晶体结构、电子结构和光学性质已得到广泛研究。为了进一步阐明该体系中的电荷分布和载流子输运,对电子 - 空穴复合动力学进行了研究。发现氮掺杂在价带顶上方诱导出一个较浅的杂质带,导致杂质原子周围出现显著的电荷局域化。分子动力学(NAMD)模拟表明,氮掺杂体系具有更长的电子 - 空穴非辐射复合时间尺度。因此,我们证明杂质带的形成和电荷局域化在抑制氮掺杂体系中的电子 - 空穴复合方面起着至关重要的作用。这项工作有助于理解氮掺杂氧化铜中的载流子输运机制。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5a13/10413821/3adc1ae2f2e1/ao3c03916_0002.jpg

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