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用于神经形态系统的氧化铟锡/氮化硅/氮化钽电阻开关器件模拟的人工突触

Artificial Synapse Emulated by Indium Tin Oxide/SiN/TaN Resistive Switching Device for Neuromorphic System.

作者信息

Ju Dongyeol, Kim Sunghun, Kim Sungjun

机构信息

Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, Republic of Korea.

出版信息

Nanomaterials (Basel). 2023 Sep 1;13(17):2477. doi: 10.3390/nano13172477.

Abstract

In this paper, we fabricate an ITO/SiN/TaN memristor device and analyze its electrical characteristics for a neuromorphic system. The device structure and chemical properties are investigated using transmission electron microscopy and X-ray photoelectron spectroscopy. Uniform bipolar switching is achieved through DC sweep under a compliance current of 5 mA. Also, the analog reset phenomenon is observed by modulating the reset voltage for long-term memory. Additionally, short-term memory characteristics are obtained by controlling the strength of the pulse response. Finally, bio-inspired synaptic characteristics are emulated using Hebbian learning rules such as spike-rate-dependent plasticity (SRDP) and spike-timing-dependent plasticity (STDP). As a result, we believe that the coexistence of short-term and long-term memories in the ITO/SiN/TaN device can provide flexibility in device design in future neuromorphic applications.

摘要

在本文中,我们制造了一种氧化铟锡/氮化硅/氮化钽忆阻器器件,并分析了其在神经形态系统中的电学特性。使用透射电子显微镜和X射线光电子能谱对器件结构和化学性质进行了研究。在5 mA的顺从电流下通过直流扫描实现了均匀的双极开关。此外,通过调制复位电压观察到用于长期记忆的模拟复位现象。此外,通过控制脉冲响应的强度获得了短期记忆特性。最后,使用诸如脉冲率依赖可塑性(SRDP)和脉冲时间依赖可塑性(STDP)等赫布学习规则来模拟受生物启发的突触特性。结果,我们认为氧化铟锡/氮化硅/氮化钽器件中短期和长期记忆的共存可以为未来神经形态应用中的器件设计提供灵活性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4375/10490079/1aafe4d082f9/nanomaterials-13-02477-g001.jpg

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