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通过简便低成本的室温高压(HP)-PECVD法合成用于太阳能电池的透明碘化亚铜薄膜。

Synthesis of Transparent CuI Thin Films by a Facile Low-Cost High Pressure (HP)-PECVD Method at Room Temperature for the Application in Solar Cells.

作者信息

Sanyal Dipto Arindam, Mondal Liton, Hossain Jaker, Rashid M Mamunur, Hossain M Khalid, Roy Nepal C, Rashid Talukder Mamunur

机构信息

Plasma Science and Technology Lab, Department of Electrical and Electronic Engineering, University of Rajshahi, Rajshahi, 6205, Bangladesh.

Plasma-processed Functional Materials Laboratory, Department of Electrical and Electronic Engineering, University of Rajshahi, Rajshahi, 6205, Bangladesh.

出版信息

ChemistryOpen. 2023 Sep;12(9):e202300067. doi: 10.1002/open.202300067.

DOI:10.1002/open.202300067
PMID:37699775
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10497402/
Abstract

Copper iodide (CuI) thin films were prepared on a glass substrate by a facile high pressure (HP)-PECVD method at room temperature. For this, CuI powder was dissolved in CH CN. The CuI vapor with plasma was investigated by Optical Emission Spectroscopic (OES) data for identifying the species in the plasma. The XRD study reveals the polycrystalline nature of the films. The SEM analyses indicate the homogeneity of the films. The EDS mapping confirms that the thin films mostly consisted of carbon followed by nitrogen, copper and iodine, respectively. The band gaps of CuI thin films were in the range of ~2.71-3.14 eV. The high transmittance and band gap engineering in HP-PECVD-synthesized CuI thin films indicates their potential use as window and hole transport layers in low cost solar cells.

摘要

通过简便的室温高压(HP)-PECVD 方法在玻璃基板上制备了碘化铜(CuI)薄膜。为此,将 CuI 粉末溶解在 CH CN 中。利用光发射光谱(OES)数据研究了含等离子体的 CuI 蒸气,以识别等离子体中的物种。XRD 研究揭示了薄膜的多晶性质。SEM 分析表明薄膜具有均匀性。EDS 映射证实薄膜主要分别由碳、氮、铜和碘组成。CuI 薄膜的带隙在约 2.71 - 3.14 eV 范围内。HP-PECVD 合成的 CuI 薄膜的高透过率和带隙工程表明它们在低成本太阳能电池中作为窗口和空穴传输层具有潜在用途。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/03718dccb2da/OPEN-12-e202300067-g004.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/b1b942befdf6/OPEN-12-e202300067-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/a0b0aae9b418/OPEN-12-e202300067-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/b07c1bb5f7d4/OPEN-12-e202300067-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/03718dccb2da/OPEN-12-e202300067-g004.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/093c8467a5fd/OPEN-12-e202300067-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/5b062f7da38f/OPEN-12-e202300067-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/3a858809fd72/OPEN-12-e202300067-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/8ea2edac2e48/OPEN-12-e202300067-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/ba3d7309f6af/OPEN-12-e202300067-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/b1b942befdf6/OPEN-12-e202300067-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/a0b0aae9b418/OPEN-12-e202300067-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/b07c1bb5f7d4/OPEN-12-e202300067-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8e70/10497402/03718dccb2da/OPEN-12-e202300067-g004.jpg

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本文引用的文献

1
Simple and Scalable Chemical Surface Patterning via Direct Deposition from Immobilized Plasma Filaments in a Dielectric Barrier Discharge.通过在介质阻挡放电中固定的等离子体丝直接沉积实现简单且可扩展的化学表面图案化。
Adv Sci (Weinh). 2022 May;9(15):e2200237. doi: 10.1002/advs.202200237. Epub 2022 Mar 27.
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Atomic Layer Deposition on Polymer Thin Films: On the Role of Precursor Infiltration and Reactivity.聚合物薄膜上的原子层沉积:前驱体渗透和反应性的作用
ACS Appl Mater Interfaces. 2021 Sep 29;13(38):46151-46163. doi: 10.1021/acsami.1c12933. Epub 2021 Sep 14.
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Room-temperature Domain-epitaxy of Copper Iodide Thin Films for Transparent CuI/ZnO Heterojunctions with High Rectification Ratios Larger than 10(9).
用于制备具有大于10⁹的高整流比的透明CuI/ZnO异质结的碘化亚铜薄膜的室温畴外延
Sci Rep. 2016 Feb 26;6:21937. doi: 10.1038/srep21937.
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