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用于多功能p型透明半导体和导体的工程碘化亚铜(CuI)。

Engineering Copper Iodide (CuI) for Multifunctional p-Type Transparent Semiconductors and Conductors.

作者信息

Liu Ao, Zhu Huihui, Kim Myung-Gil, Kim Junghwan, Noh Yong-Young

机构信息

Department of Chemical Engineering Pohang University of Science and Technology (POSTECH) Pohang Gyeongbuk 37673 Republic of Korea.

School of Advanced Materials Science and Engineering Sungkyunkwan University Suwon 16419 Republic of Korea.

出版信息

Adv Sci (Weinh). 2021 May 11;8(14):2100546. doi: 10.1002/advs.202100546. eCollection 2021 Jul.

DOI:10.1002/advs.202100546
PMID:34306982
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8292905/
Abstract

Developing transparent p-type semiconductors and conductors has attracted significant interest in both academia and industry because metal oxides only show efficient n-type characteristics at room temperature. Among the different candidates, copper iodide (CuI) is one of the most promising p-type materials because of its widely adjustable conductivity from transparent electrodes to semiconducting layers in transistors. CuI can form thin films with high transparency in the visible light region using various low-temperature deposition techniques. This progress report aims to provide a basic understanding of CuI-based materials and recent progress in the development of various devices. The first section provides a brief introduction to CuI with respect to electronic structure, defect states, charge transport physics, and overviews the CuI film deposition methods. The material design concepts through doping/alloying approaches to adjust the optoelectrical properties are also discussed in the first section. The following section presents recent advances in state-of-the-art CuI-based devices, including transparent electrodes, thermoelectric devices, p-n diodes, p-channel transistors, light emitting diodes, and solar cells. In conclusion, current challenges and perspective opportunities are highlighted.

摘要

开发透明的p型半导体和导体在学术界和工业界都引起了极大的兴趣,因为金属氧化物在室温下仅表现出高效的n型特性。在不同的候选材料中,碘化铜(CuI)是最有前途的p型材料之一,因为其电导率从透明电极到晶体管中的半导体层都具有广泛的可调性。使用各种低温沉积技术,CuI可以在可见光区域形成具有高透明度的薄膜。本进展报告旨在提供对基于CuI的材料的基本理解以及各种器件开发的最新进展。第一部分简要介绍了CuI的电子结构、缺陷态、电荷传输物理,并概述了CuI薄膜沉积方法。第一部分还讨论了通过掺杂/合金化方法来调节光电性能的材料设计概念。接下来的部分介绍了基于CuI的最先进器件的最新进展,包括透明电极、热电器件、p-n二极管、p沟道晶体管、发光二极管和太阳能电池。最后,突出了当前的挑战和潜在的机遇。

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