Changyom Preecha, Leksakul Komgrit, Boonyawan Dheerawan, Premphet Pongsawat, Vichiansan Norrapon
Ph.D. Degree Program in Industrial Engineering, Department of Industrial Engineering, Faculty of Engineering, Chiang Mai University, Chiang Mai 50200, Thailand.
Department of Industrial Engineering, Faculty of Engineering, Chiang Mai University, Chiang Mai 50200, Thailand.
Heliyon. 2023 Nov 11;9(11):e22247. doi: 10.1016/j.heliyon.2023.e22247. eCollection 2023 Nov.
Complex multilayer film structures were fabricated through a custom-built angular DC magnetron co-sputtering system. In this system, separate Cu, Al, and brass (Cu + Zn) targets were mounted on three magnetron guns, working in conjunction with a rotating substrate. This study aimed to compare the properties of films with intricate structures, which were sputtered onto glass slides and polypropylene substrates. The sputtering process was optimized using a Box-Behnken design, considering three variable operating conditions: substrate rotation speed, sputtering time, and sputtering voltage. The Analysis of Variance (ANOVA) results for film thickness and roughness, sputtered with three different materials onto glass slides and polypropylene (PP) substrates, indicated that all three independent variables significantly influenced the optimum response, with -values less than 0.05 (<α = 0.05). The optimal conditions for maximizing the thickness and roughness of the sputtered film on PP substrates differed from those obtained for the thin-film properties of the sputtered film on glass slide substrates. Top-view images of the surface morphology revealed a dense and granular structure for the film deposited on the glass slide, whereas some grooves between the grains and fractures were observed in the film on the PP substrate. Additionally, it was evident that these sputtered multilayer films exhibited a complex structure, as reflected in the uniform and homogeneous distribution of Cu, Al, and Zn atoms on both glass slides and PP substrates.
通过定制的角向直流磁控共溅射系统制备了复杂的多层膜结构。在该系统中，分别将铜、铝和黄铜（铜 + 锌）靶材安装在三个磁控枪上，并与旋转的衬底协同工作。本研究旨在比较溅射在载玻片和聚丙烯衬底上的具有复杂结构的薄膜的性能。使用Box-Behnken设计对溅射工艺进行了优化，考虑了三个可变操作条件：衬底转速、溅射时间和溅射电压。对用三种不同材料溅射在载玻片和聚丙烯（PP）衬底上的薄膜厚度和粗糙度的方差分析（ANOVA）结果表明，所有三个自变量均对最佳响应有显著影响，P值小于0.05（<α = 0.05）。使PP衬底上溅射薄膜的厚度和粗糙度最大化的最佳条件与载玻片衬底上溅射薄膜的薄膜性能所获得的条件不同。表面形貌的顶视图显示，沉积在载玻片上的薄膜具有致密的颗粒结构，而在PP衬底上的薄膜中观察到晶粒之间存在一些沟槽和裂缝。此外，很明显这些溅射的多层膜呈现出复杂的结构，这体现在铜、铝和锌原子在载玻片和PP衬底上的均匀分布上。
