Wu Hao, Yang Li, Zhang Gaojie, Jin Wen, Xiao Bichen, Zhang Wenfeng, Chang Haixin
Center for Joining and Electronic Packaging, State Key Laboratory of Material Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China.
Institute for Quantum Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China.
Small Methods. 2024 Sep;8(9):e2301524. doi: 10.1002/smtd.202301524. Epub 2024 Jan 31.
Developing novel high-temperature van der Waals ferromagnetic semiconductor materials and investigating their interface coupling effects with 2D topological semimetals are pivotal for advancing next-generation spintronic and quantum devices. However, most van der Waals ferromagnetic semiconductors exhibit ferromagnetism only at low temperatures, limiting the proximity research on their interfaces with topological semimetals. Here, an intrinsic, van der Waals layered room-temperature ferromagnetic semiconductor crystal, FeCrGaSe (FCGS), is reported with a Curie temperature (T) as high as 370 K, setting a new record for van der Waals ferromagnetic semiconductors. The saturation magnetization at low temperature (2 K) and room temperature (300 K) reaches 8.2 and 2.7 emu g, respectively. Furthermore, FCGS possesses a bandgap of ≈1.2 eV, which is comparable to the widely used commercial silicon. The FCGS/graphene 2D heterostructure exhibits an impeccably smooth and gapless interface, thereby inducing a robust van der Waals magnetic proximity coupling effect between FCGS and graphene. After the proximity coupling, graphene undergoes a charge carrier transition from electrons to holes, accompanied by a transition from non-magnetic to ferromagnetic transport behavior with robust anomalous Hall effect (AHE). Notably, the van der Waals magnetic proximity-induced AHE remains robust even up to 400 K.
开发新型高温范德华铁磁半导体材料并研究它们与二维拓扑半金属的界面耦合效应对于推动下一代自旋电子器件和量子器件至关重要。然而,大多数范德华铁磁半导体仅在低温下表现出铁磁性,这限制了它们与拓扑半金属界面的相关研究。在此,报道了一种本征的范德华层状室温铁磁半导体晶体FeCrGaSe(FCGS),其居里温度(Tc)高达370 K,创下了范德华铁磁半导体的新纪录。低温(2 K)和室温(300 K)下的饱和磁化强度分别达到8.2和2.7 emu g。此外,FCGS具有约1.2 eV的带隙,与广泛使用的商用硅相当。FCGS/石墨烯二维异质结构表现出完美光滑且无间隙的界面,从而在FCGS和石墨烯之间诱导出强大的范德华磁近邻耦合效应。近邻耦合后,石墨烯经历了从电子到空穴的载流子转变,伴随着从非磁性到铁磁性输运行为的转变以及强大的反常霍尔效应(AHE)。值得注意的是,范德华磁近邻诱导的AHE即使在高达400 K时仍保持强大。