Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching.
作者信息
Gao Lang, Liang Youting, Song Lvbin, Yin Difeng, Qi Jia, Chen Jinming, Liu Zhaoxiang, Yu Jianping, Liu Jian, Zhang Haisu, Fang Zhiwei, Qi Hongxin, Cheng Ya
出版信息
Opt Lett. 2024 Feb 1;49(3):614-617. doi: 10.1364/OL.512220.
PMID:38300072
Abstract
We report an electro-optic isolator fabricated on thin-film lithium niobate by photolithography-assisted chemo-mechanical etching that shows an isolation of 39.50 dB and an overall fiber-to-fiber loss of 2.6 dB.
摘要
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