Dalouji Vali, Goudarzi Samira
Department of Physics, Faculty of Science, Malayer University, Malayer, Iran.
ACS Omega. 2024 Jan 19;9(4):4339-4346. doi: 10.1021/acsomega.3c06181. eCollection 2024 Jan 30.
The purpose of this work is a stereometric analysis of Ni-Cu thin films to obtain the three-dimensional (3D) microtexture surface based on atomic force microscopy (AFM). Four Ni-Cu thin films on glass and silicon substrates were prepared by a capacitively coupled RF-PECVD system with a 13.56 MHz power supply. The AFM data of the samples were stereometrically analyzed, and the surface microtexture was determined according to the definition of relevant parameters in the standards ISO 25178-2:2012 and ASME B46.1-2009. All microtexture features can be implemented in numerical programs to simulate advanced microtexture models under specific microstructure and composition conditions. The results can be used to validate theoretical models for predicting or correlating the surface parameters of nanostructures. The Ni-Cu films with 40% Cu have a more irregular surface; hence, the maximum Sq value of the as-deposited Ni-Cu films is about 81.24 μm. The core roughness height Sk is calculated as a difference between two extreme levels (maximal and minimal) of the surface core, for which Ni-Cu films with 40% Cu have a maximum value of 183.4 μm. Since the surface kurtosis (Sku) of all sample films was lower than 7, there are very small peaks or valleys on the film surface and for Ni-Cu films with 5% Cu with a value of 3.568. With increasing Cu content, the height distribution histograms of films show more uniform distributions.
这项工作的目的是基于原子力显微镜(AFM)对镍铜薄膜进行立体分析,以获得三维(3D)微观纹理表面。采用配备13.56 MHz电源的电容耦合射频PECVD系统在玻璃和硅衬底上制备了四种镍铜薄膜。对样品的AFM数据进行了立体分析,并根据ISO 25178-2:2012和ASME B46.1-2009标准中相关参数的定义确定了表面微观纹理。所有微观纹理特征都可以在数值程序中实现,以模拟特定微观结构和成分条件下的先进微观纹理模型。结果可用于验证预测或关联纳米结构表面参数的理论模型。含40%铜的镍铜薄膜表面更不规则;因此,沉积态镍铜薄膜的最大Sq值约为81.24μm。核心粗糙度高度Sk计算为表面核心两个极端水平(最大和最小)之间的差值,含40%铜的镍铜薄膜的Sk最大值为183.4μm。由于所有样品薄膜的表面峰度(Sku)均低于7,薄膜表面存在非常小的峰或谷,含5%铜的镍铜薄膜的Sku值为3.568。随着铜含量的增加,薄膜的高度分布直方图显示出更均匀的分布。