Moreno-García H, Sigala-Valdez J O, Martínez-Blanco Ma Del Rosario, Cruz Reyes I, Durón-Torres S M, Escalante-García I L, Del Rio-De Santiago A
Laboratorio Nacional-CIACyT, Universidad Autónoma de San Luis Potosí, Av. Sierra Leona # 550, Lomas 2a Sección, San Luis Potosí, SLP C.P. 78210, Mexico.
Unidad Académica de Ciencias Químicas, Universidad Autónoma de Zacatecas, Campus Universitario Siglo XXI, Carr. Zacatecas - Guadalajara Km. 6. Col. Ejido "La Escondida" Zacatecas, Zacatecas, C.P. 98160, Mexico.
Heliyon. 2024 Feb 20;10(4):e26703. doi: 10.1016/j.heliyon.2024.e26703. eCollection 2024 Feb 29.
The crystallographic, optical, and electrical properties of manganese sulfide thin films depend on the control of the temperature precursors in the synthesis process, as shown by the results of this work. MnS thin films were deposited on glass substrates using the SILAR method and over an additional layer of CdS synthesized by chemical bath deposition (CBD) to acquire a p-n heterojunction. SILAR is an inexpensive method performed with a homemade robot in this case. Temperature in the solution precursors varied from 20 to 80 °C in four experiments. The morphology and structure of MnS and FTO/CdS/MnS thin films were studied through scanning electron microscopy (SEM) and grazing-incidence X-ray diffraction (GIXRD); the results indicate that materials showed a polycrystalline behavior, a diffraction peak of - MnS cubic phase was observed with lattice constants values, ranging from 4.74 to 4.75 Å. Additionally, Raman spectroscopy showed a signal corresponding to the transversal optical phonons of MnS at a wavenumber near 300 cm. UV-vis spectroscopy showed optical bandgap values of 3.94, 4.0, 4.09, and 4.26 eV for thin films obtained at 20°, 40°, 60°, and 80 °C. respectively. Results indicated 80 °C as an optimal cationic precursor process temperature, achieving optical transmittance T% and good film quality according to SEM and GIXRD for the synthetization of MnS. The current-voltage (I-V) characterization in the heterojunction showed a characteristic diode curve with an open circuit voltage (VOC) of 300 mV under illumination, which indicated that the manganese sulfide behaves as p-type material contributing with positive charge carriers, while CdS behaves as n-type material.
如本工作结果所示,硫化锰薄膜的晶体学、光学和电学性质取决于合成过程中温度前驱体的控制。采用连续离子层吸附反应(SILAR)法在玻璃基板上沉积硫化锰薄膜,并在通过化学浴沉积(CBD)合成的硫化镉附加层上沉积,以获得p-n异质结。在这种情况下,SILAR是一种使用自制机器人进行的廉价方法。在四个实验中,溶液前驱体的温度在20至80°C之间变化。通过扫描电子显微镜(SEM)和掠入射X射线衍射(GIXRD)研究了硫化锰和FTO/CdS/MnS薄膜的形貌和结构;结果表明材料呈现多晶行为,观察到硫化锰立方相的衍射峰,其晶格常数在4.74至4.75 Å范围内。此外,拉曼光谱显示在波数接近300 cm处有一个对应于硫化锰横向光学声子的信号。紫外-可见光谱显示,在20°C、40°C、60°C和80°C下获得的薄膜的光学带隙值分别为3.94、4.0、4.09和4.26 eV。结果表明80°C是阳离子前驱体的最佳工艺温度,根据扫描电子显微镜和掠入射X射线衍射结果,在合成硫化锰时可实现光学透过率T%和良好的薄膜质量。异质结中的电流-电压(I-V)特性显示出特征二极管曲线,在光照下开路电压(VOC)为300 mV,这表明硫化锰表现为贡献正电荷载流子的p型材料,而硫化镉表现为n型材料。