Bleiji Yorick, Cordaro Andrea, Tabernig Stefan W, Alarcón-Lladó Esther
Center for Nanophotonics, AMOLF, Science Park 104, 1098 XG Amsterdam, The Netherlands.
ACS Appl Opt Mater. 2024 Mar 13;2(3):508-516. doi: 10.1021/acsaom.4c00037. eCollection 2024 Mar 22.
A scalable selective-area electrochemical method is reported for the fabrication of interconnected metal nanostructures. In this work, the fabrication of silver nanowire grids for the application of transparent electrodes is explored. The presented method is based on a through-the-mask electrodeposition method, where the mask is made by using substrate conformal imprint lithography. We find that the nucleation density of the silver nanoparticles is the key parameter for successful homogeneous void-free filling of the template. We independently controlled the density of the silver nuclei and their growth by using a double potential pulse. The silver nanowire grids show high transmission (95.9%) and low sheet resistance (as low as 3.7 Ω/sq), resulting in a superior figure of merit (FoM). Due to the bottom-up nature of this technique, arbitrarily high aspect ratio nanowires can be achieved, therefore decreasing the sheet resistance without affecting transmittance and carrier collection. The presented method can be generalized to the large-area nanofabrication of any well-defined nanostructure design of any metal transparent electrode for multiple applications.
报道了一种用于制备互连金属纳米结构的可扩展的选择性区域电化学方法。在这项工作中，探索了用于透明电极应用的银纳米线网格的制备。所提出的方法基于一种掩膜电化学沉积方法，其中掩膜是通过使用衬底共形压印光刻技术制作的。我们发现银纳米颗粒的成核密度是成功均匀无空隙填充模板的关键参数。我们通过使用双电位脉冲独立控制银核的密度及其生长。银纳米线网格显示出高透射率（95.9%）和低方阻（低至3.7Ω/sq），从而具有优异的品质因数（FoM）。由于该技术的自下而上的性质，可以实现任意高的纵横比纳米线，因此在不影响透射率和载流子收集的情况下降低方阻。所提出的方法可以推广到用于多种应用的任何金属透明电极的任何明确纳米结构设计的大面积纳米制造。
