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双轴应变LaGaO₃/BaSnO₃异质结构中二维电子气形成机制及电学性质的密度泛函理论研究

Density functional theory study on the formation mechanism and electrical properties of two-dimensional electron gas in biaxial-strained LaGaO /BaSnO heterostructure.

作者信息

Li Yuling, Huang Yuxi, Liu Xiaohua, Wang Yaqin, Yuan Le

机构信息

Key Laboratory of Fluid and Power Machinery, School of Material Science and Engineering, Xihua University, Chengdu, 610039, People's Republic of China.

State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 610054, People's Republic of China.

出版信息

Sci Rep. 2024 May 4;14(1):10259. doi: 10.1038/s41598-024-60893-y.

Abstract

The two-dimensional electron gas (2DEG) in BaSnO -based heterostructure (HS) has received tremendous attention in the electronic applications because of its excellent electron migration characteristic. We modeled the n-type (LaO) /(SnO ) interface by depositing LaGaO film on the BaSnO substrate and explored strain effects on the critical thickness for forming 2DEG and electrical properties of LaGaO /BaSnO HS system using first-principles electronic structure calculations. The results indicate that to form 2DEG in the unstrained LaGaO /BaSnO HS system, a minimum thickness of approximately 4 unit cells of LaGaO film is necessary. An increased film thickness of LaGaO is required to form the 2DEG for -3%-biaxially-strained HS system and the critical thickness is 3 unit cells for 3%-baxially-strained HS system, which is caused by the strain-induced change of the electrostatic potential in LaGaO film. In addition, the biaxial strain plays an important role in tailoring the electrical properties of 2DEG in LaGaO /BaSnO HS syestem. The interfacial charge carrier density, electron mobility and electrical conductivity can be optimized when a moderate tensile strain is applied on the BaSnO substrate in the ab-plane.

摘要

基于BaSnO的异质结构(HS)中的二维电子气(2DEG)因其优异的电子迁移特性在电子应用中受到了极大关注。我们通过在BaSnO衬底上沉积LaGaO薄膜对n型(LaO)/(SnO)界面进行建模,并使用第一性原理电子结构计算探索了应变对形成2DEG的临界厚度以及LaGaO/BaSnO HS系统电学性质的影响。结果表明,在无应变的LaGaO/BaSnO HS系统中形成2DEG,LaGaO薄膜的最小厚度约为4个晶胞。对于-3%双轴应变的HS系统,形成2DEG需要增加LaGaO薄膜的厚度,而对于3%双轴应变的HS系统,临界厚度为3个晶胞,这是由LaGaO薄膜中静电势的应变诱导变化引起的。此外,双轴应变在调节LaGaO/BaSnO HS系统中2DEG的电学性质方面起着重要作用。当在ab平面内对BaSnO衬底施加适度的拉伸应变时,界面电荷载流子密度、电子迁移率和电导率可以得到优化。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f28a/11636876/8da8076fd6e3/41598_2024_60893_Fig1_HTML.jpg

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