Zhang Leifeng, Lorut Frédéric, Gruel Kilian, Hÿtch Martin J, Gatel Christophe
CEMES-CNRS, Université Paul Sabatier, 29 rue Jeanne Marvig, 31055 Toulouse, France.
STMicroelectronics, 820 rue Jean Monnet, 38920 Crolles, France.
Nano Lett. 2024 May 15;24(19):5913-5919. doi: 10.1021/acs.nanolett.4c01462. Epub 2024 May 6.
Electrical resistivity is the key parameter in the active regions of many current nanoscale devices, from memristors to resistive random-access memory and phase-change memories. The local resistivity of the materials is engineered on the nanoscale to fit the performance requirements. Phase-change memories, for example, rely on materials whose electrical resistance increases dramatically with a change from a crystalline to an amorphous phase. Electrical characterization methods have been developed to measure the response of individual devices, but they cannot map the local resistance across the active area. Here, we propose a method based on electron holography to determine the local resistance within working devices. Upon switching the device, we show that electrical resistance is inhomogeneous on the scale of only a few nanometers.
电阻率是许多当前纳米级器件有源区的关键参数,从忆阻器到电阻式随机存取存储器和相变存储器皆是如此。材料的局部电阻率在纳米尺度上进行设计,以满足性能要求。例如,相变存储器依赖于电阻随从晶态到非晶态变化而急剧增加的材料。已经开发出电学表征方法来测量单个器件的响应,但它们无法绘制出有源区域的局部电阻。在此,我们提出一种基于电子全息术的方法来确定工作器件内的局部电阻。在切换器件时,我们表明电阻在仅几纳米的尺度上是不均匀的。