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氧析出反应对CoO、CoFeO和FeO外延膜电催化剂的晶面依赖性

Facet Dependence of the Oxygen Evolution Reaction on CoO, CoFeO, and FeO Epitaxial Film Electrocatalysts.

作者信息

Davis Earl Matthew, Bergmann Arno, Kuhlenbeck Helmut, Roldan Cuenya Beatriz

机构信息

Department of Interface Science, Fritz Haber Institute of the Max Planck Society, Faradayweg 4-6, 14195 Berlin, Germany.

出版信息

J Am Chem Soc. 2024 May 22;146(20):13770-13782. doi: 10.1021/jacs.3c13595. Epub 2024 May 8.

Abstract

The main obstacle for the electrocatalytic production of "green hydrogen" is finding suitable electrocatalysts which operate highly efficiently over extended periods of time. The topic of this study is the oxygen evolution reaction (OER), one of the half-reactions of water splitting. It is complex and has intricate kinetics, which impairs the reaction efficiency. Transition metal oxides have shown potential as electrocatalysts for this reaction, but much remains unknown about the atomic scale processes. We have investigated structure-composition-reactivity correlations for CoO, CoFeO, and FeO epitaxial thin-film electrocatalysts exposing either the (001) or (111) surface facets. We found that for CoO, the (001) facet is more reactive, while for the other oxides, the (111) facet is more active. A Tafel-like evaluation reveals systematically smaller "Tafel" slopes for the (001) facets. Furthermore, the slopes are smaller for the iron-containing films. Additionally, we found that the oxyhydroxide skin layer which forms under OER reaction conditions is thicker on the cobalt oxides than on the other oxides, which we attribute to either a different density of surface defects or to iron hindering the growth of the skin layers. All studied skin layers were thinner than 1 nm.

摘要

“绿色氢气”电催化生产的主要障碍是找到能在长时间内高效运行的合适电催化剂。本研究的主题是析氧反应(OER),它是水分解的半反应之一。该反应复杂且动力学过程错综复杂,这降低了反应效率。过渡金属氧化物已显示出作为该反应电催化剂的潜力,但在原子尺度过程方面仍有许多未知之处。我们研究了暴露(001)或(111)表面晶面的CoO、CoFeO和FeO外延薄膜电催化剂的结构 - 组成 - 反应活性相关性。我们发现,对于CoO,(001)晶面更具反应活性,而对于其他氧化物,(111)晶面更活跃。类似塔菲尔的评估系统地揭示了(001)晶面的“塔菲尔”斜率更小。此外,含铁薄膜的斜率更小。此外,我们发现,在OER反应条件下形成的羟基氧化物表层在钴氧化物上比在其他氧化物上更厚,我们将此归因于表面缺陷密度不同或铁阻碍了表层的生长。所有研究的表层厚度均小于1 nm。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0942/11117179/04b25b3e6d0d/ja3c13595_0001.jpg

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