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用于周期和形状可调的不对称纳米光栅连续图案化的方位角旋转控制纳米刻写

Azimuthal rotation-controlled nanoinscribing for continuous patterning of period- and shape-tunable asymmetric nanogratings.

作者信息

Lee Useung, Kim Hyein, Oh Dong Kyo, Lee Nayeong, Park Jonggab, Park Jaewon, Son Hyunji, Noh Hyunchan, Rho Junsuk, Ok Jong G

机构信息

Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea.

Present Address: Department of Mechanical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul, 02841 Republic of Korea.

出版信息

Microsyst Nanoeng. 2024 May 11;10:60. doi: 10.1038/s41378-024-00687-4. eCollection 2024.

Abstract

We present an azimuthal-rotation-controlled dynamic nanoinscribing (ARC-DNI) process for continuous and scalable fabrication of asymmetric nanograting structures with tunable periods and shape profiles. A sliced edge of a nanograting mold, which typically has a rectangular grating profile, slides over a polymeric substrate to induce its burr-free plastic deformation into a linear nanopattern. During this continuous nanoinscribing process, the "azimuthal angle," that is, the angle between the moving direction of the polymeric substrate and the mold's grating line orientation, can be controlled to tailor the period, geometrical shape, and profile of the inscribed nanopatterns. By modulating the azimuthal angle, along with other important ARC-DNI parameters such as temperature, force, and inscribing speed, we demonstrate that the mold-opening profile and temperature- and time-dependent viscoelastic polymer reflow can be controlled to fabricate asymmetric, blazed, and slanted nanogratings that have diverse geometrical profiles such as trapezoidal, triangular, and parallelogrammatic. Finally, period- and profile-tunable ARC-DNI can be utilized for the practical fabrication of diverse optical devices, as is exemplified by asymmetric diffractive optical elements in this study.

摘要

我们展示了一种方位角旋转控制的动态纳米刻写(ARC-DNI)工艺,用于连续且可扩展地制造具有可调周期和形状轮廓的不对称纳米光栅结构。纳米光栅模具的切片边缘(通常具有矩形光栅轮廓)在聚合物基底上滑动,以使其无毛刺地塑性变形为线性纳米图案。在这个连续的纳米刻写过程中,“方位角”,即聚合物基底的移动方向与模具光栅线方向之间的夹角,可以被控制,以调整刻写纳米图案的周期、几何形状和轮廓。通过调制方位角,以及其他重要的ARC-DNI参数,如温度、力和刻写速度,我们证明了可以控制模具开口轮廓以及温度和时间相关的粘弹性聚合物回流,以制造具有梯形、三角形和平行四边形等多种几何轮廓的不对称、闪耀和倾斜的纳米光栅。最后,周期和轮廓可调的ARC-DNI可用于实际制造各种光学器件,本研究中的不对称衍射光学元件就是一个例子。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2a2a/11088629/276e7988ebb3/41378_2024_687_Fig1_HTML.jpg

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