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具有高增益和低噪声的表面法线照明伪平面硅基锗雪崩光电二极管。

Surface-normal illuminated pseudo-planar Ge-on-Si avalanche photodiodes with high gain and low noise.

作者信息

Fleming Fiona, Yi Xin, Mirza Muhammad M A, Jin Xiao, Kirdoda Jaroslaw, Dumas Derek C S, Saalbach Lisa, Modak Mrudul, Muir Dave A S, Smith Charlie, Coughlan Conor, Tian Qingyu, Millar Ross W, David John P R, Paul Douglas J, Buller Gerald S

出版信息

Opt Express. 2024 May 20;32(11):19449-19457. doi: 10.1364/OE.521417.

Abstract

Germanium-on-Silicon (Ge-on-Si) avalanche photodiodes (APDs) are of considerable interest as low intensity light detectors for emerging applications. The Ge absorption layer detects light at wavelengths up to ≈ 1600 nm with the Si acting as an avalanche medium, providing high gain with low excess avalanche noise. Such APDs are typically used in waveguide configurations as growing a sufficiently thick Ge absorbing layer is challenging. Here, we report on a new vertically illuminated pseudo-planar Ge-on-Si APD design utilizing a 2 µm thick Ge absorber and a 1.4 µm thick Si multiplication region. At a wavelength of 1550 nm, 50 µm diameter devices show a responsivity of 0.41 A/W at unity gain, a maximum avalanche gain of 101 and an excess noise factor of 3.1 at a gain of 20. This excess noise factor represents a record low noise for all configurations of Ge-on-Si APDs. These APDs can be inexpensively manufactured and have potential integration in silicon photonic platforms allowing use in a variety of applications requiring high-sensitivity detectors at wavelengths around 1550 nm.

摘要

硅基锗雪崩光电二极管(Ge-on-Si APD)作为新兴应用中的低强度光探测器备受关注。锗吸收层可探测波长高达约1600纳米的光,硅作为雪崩介质,能提供高增益且过量雪崩噪声低。此类APD通常用于波导配置,因为生长足够厚的锗吸收层具有挑战性。在此,我们报告一种新型垂直照明伪平面硅基锗APD设计,其采用2微米厚的锗吸收体和1.4微米厚的硅倍增区。在波长1550纳米处,直径50微米的器件在单位增益下的响应度为0.41安/瓦,最大雪崩增益为101,在增益为20时过量噪声因子为3.1。该过量噪声因子代表了硅基锗APD所有配置中的最低噪声记录。这些APD可以低成本制造,并且有可能集成到硅光子平台中,从而可用于各种需要1550纳米左右波长高灵敏度探测器的应用中。

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