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氧化锌原子层沉积/分子层沉积混合薄膜生长反应路径的建模:一项密度泛函理论研究。

Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films: a DFT study.

作者信息

Mäkinen Mario, Weckman Timo, Laasonen Kari

机构信息

Department of Chemistry and Materials Science, School of Chemical Engineering, Aalto University, Kemistintie 1, 02150, Espoo, Finland.

Department of Chemistry, University of Jyväskylä, Survontie 9 B, 40500, Jyväskylä, Finland.

出版信息

Phys Chem Chem Phys. 2024 Jun 19;26(24):17334-17344. doi: 10.1039/d4cp00249k.

Abstract

ALD/MLD hybrid thin films can be fabricated by combining atomic layer deposition (ALD) and molecular layer deposition (MLD). Even though this deposition method has been extensively used experimentally, the computational work required to acquire the reaction paths during the thin film deposition process is still in dire demand. We investigated hybrid thin films consisting of diethyl zinc and either 4-aminophenol or hydroquinone using both gas-phase and surface reactions to gain extensive knowledge of the complex phenomena occurring during the process of hybrid thin film deposition. We used density functional theory (DFT) to obtain the activation energies of these kinetic-dependent deposition processes. Different processes of ethyl ligand removal as ethane were discovered, and we found that the hydroxyl group of 4-aminophenol was more reactive than the amino group in the migration of hydrogen to an ethyl ligand within a complicated branching reaction chain.

摘要

ALD/MLD混合薄膜可通过结合原子层沉积(ALD)和分子层沉积(MLD)来制备。尽管这种沉积方法已在实验中广泛使用,但在薄膜沉积过程中获取反应路径所需的计算工作仍亟待开展。我们研究了由二乙基锌与4-氨基苯酚或对苯二酚组成的混合薄膜,采用气相和表面反应以深入了解混合薄膜沉积过程中发生的复杂现象。我们使用密度泛函理论(DFT)来获得这些动力学相关沉积过程的活化能。发现了作为乙烷去除乙基配体的不同过程,并且我们发现在复杂的分支反应链中,4-氨基苯酚的羟基在氢向乙基配体迁移方面比氨基更具反应性。

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