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氧化锌原子层沉积/分子层沉积混合薄膜生长反应路径的建模:二乙基锌脉冲及前驱体筛选的密度泛函理论研究

Modelling of growth reaction pathways of zincone ALD/MLD hybrid thin films: a DFT study of precursor screening and the diethyl zinc pulse.

作者信息

Mäkinen Mario, Laasonen Kari

机构信息

Department of Chemistry and Materials Science, School of Chemical Engineering, Aalto University Kemistintie 1 02150 Espoo Finland

出版信息

RSC Adv. 2025 May 15;15(21):16299-16311. doi: 10.1039/d5ra00686d.

Abstract

ALD/MLD hybrid thin films can be fabricated by combining atomic and molecular layer deposition (ALD and MLD). Density functional theory (DFT) can be used to determine the reaction paths of the growth reactions of these hybrid thin films. In this study, DFT was utilized to investigate the reaction mechanisms between diethyl zinc and 4-aminophenol using a surface model to examine the reactions responsible for the structure of the zincone thin film. The most feasible reaction path for the film growth was discovered. The effects of reconstructions, steric repulsion and functional group reactivity on the growth rate were also discussed in this study. Additionally, we compared the thin film growth reactions between diethyl zinc and thirteen organic bifunctional precursors using gas-phase calculations. This allowed us to create a trend for the reactivity of the precursors based on their functional groups, which can be used to aid in experimental precursor selection. We also established a connection between the bond strengths of the reacting precursors and the durability of the hybrid thin film in ambient conditions.

摘要

ALD/MLD混合薄膜可以通过结合原子层沉积和分子层沉积(ALD和MLD)来制备。密度泛函理论(DFT)可用于确定这些混合薄膜生长反应的反应路径。在本研究中,利用DFT通过表面模型研究二乙基锌与4-氨基苯酚之间的反应机理,以考察对氧化锌薄膜结构起作用的反应。发现了薄膜生长最可行的反应路径。本研究还讨论了重构、空间排斥和官能团反应性对生长速率的影响。此外,我们使用气相计算比较了二乙基锌与13种有机双官能前驱体之间的薄膜生长反应。这使我们能够根据前驱体的官能团建立前驱体反应性的趋势,可用于辅助实验前驱体的选择。我们还建立了反应前驱体的键强与混合薄膜在环境条件下耐久性之间的联系。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b7bf/12080462/7e5e9426c754/d5ra00686d-f1.jpg

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