Dutems J, Crespo-Monteiro N, Faverjon F, Gâté V, Turover D, Marcellin S, Ter-Ovanessian B, Héau C, Verrier I, Normand B, Jourlin Y
CNRS, Institut d'Optique Graduate School, Laboratoire Hubert Curien UMR 5516, Université Jean Monnet Saint-Etienne, 42023, Saint-Étienne, France.
HEF IREIS, 42160, Andrézieux-Bouthéon, France.
Sci Rep. 2024 Jun 14;14(1):13804. doi: 10.1038/s41598-024-64378-w.
This article presents a sensing technique to characterize the growth of an alumina passive film on an aluminum micro structured layer in situ. The technique uses surface plasmon resonance (SPR) on aluminum coated gratings with spectroscopic measurements during electrochemical polarization in 0.02M NaSO. The structure of the sensor was first simulated and then fabricated by photolithography. The grating was then replicated by nanoimprint (NIL) in Sol-Gel before pure aluminum layer was deposited by RF magnetron sputtering to produce the samples used in this study. Coupled plasmonic and electrochemical measurements confirmed the feasibility of in situ characterization (thickness) of alumina passive film on aluminum-based gratings in neutral aqueous media. Combining both measurements with an appropriated SPR spectrum fitting lead to alumina thickness monitoring within a few nanometers' accuracy. The objectives and challenges of this study are to better characterize the alumina growth during electrochemical process combining in situ electrochemical process and SPR spectra in order to determine thin passive layer characteristics.
本文介绍了一种传感技术,用于原位表征铝微结构层上氧化铝钝化膜的生长情况。该技术利用涂铝光栅上的表面等离子体共振(SPR),并在0.02M NaSO中进行电化学极化时进行光谱测量。首先对传感器结构进行模拟,然后通过光刻制造。接着在溶胶-凝胶中通过纳米压印(NIL)复制光栅,再通过射频磁控溅射沉积纯铝层,以制备本研究中使用的样品。耦合等离子体和电化学测量证实了在中性水性介质中原位表征铝基光栅上氧化铝钝化膜(厚度)的可行性。将这两种测量与适当的SPR光谱拟合相结合,可实现几纳米精度内的氧化铝厚度监测。本研究的目标和挑战是结合原位电化学过程和SPR光谱,更好地表征电化学过程中氧化铝的生长,以确定薄钝化层的特性。