Mondal Praloy
Department of Physics, Shiv Nadar University, Greater Noida, Uttar Pradesh 201314, India.
CREST, BITS Pilani, Hyderabad, India.
Phys Chem Chem Phys. 2024 Jul 17;26(28):19380-19389. doi: 10.1039/d4cp02155j.
The present investigation deals with the effect of a BaTiO (BTO) dielectric layer on the performance of MoS/p-Si heterojunction photodetectors. The MoS/p-Si junction demonstrates a responsivity of ∼80 A W and detectivity of ∼10 Jones. The inclusion of a dielectric BTO layer significantly enhances the performance of MoS/p-Si photodetectors, leading to a remarkable improvement with a very high responsivity of ∼603 A W and detectivity of ∼10 Jones. The - characteristics of the MoS/p-Si and MoS/BTO/p-Si junctions under illumination can be understood by considering their respective energy band diagrams. This addition alters the energy band alignment, leading to higher conduction band offset and valence band offset values. The large photocurrent in forward bias in the MoS/BTO/p-Si junction may be attributed to the presence of photogenerated electrons in the depletion region of BTO. BTO exhibits characteristics such as a long carrier diffusion length and low recombination rates, contributing to a reduction in carrier recombination within the photodetector for which the photocurrent of the MoS/BTO/p-Si heterojunction can be improved significantly. The enhanced performance of the MoS/BTO/p-Si junction, characterized by higher responsivity and detectivity, underscores the potential of this heterojunction for advanced photodetection applications, suggesting promising avenues for further research and development in the field of photodetectors. A comparative study with the available literature reveals that the excellent responsivity of ∼603 A W and detectivity of ∼10 Jones of the presently studied MoS/BTO/p-Si heterojunction appear highly promising for various futuristic device applications.
本研究探讨了钛酸钡(BTO)介电层对MoS/p-Si异质结光电探测器性能的影响。MoS/p-Si结的响应度约为80 A/W,探测率约为10 Jones。引入介电BTO层显著提高了MoS/p-Si光电探测器的性能,使其响应度显著提高,达到约603 A/W的非常高的值,探测率约为10 Jones。通过考虑MoS/p-Si和MoS/BTO/p-Si结在光照下的各自能带图,可以理解它们的特性。这种添加改变了能带排列,导致更高的导带偏移和价带偏移值。MoS/BTO/p-Si结在正向偏压下的大光电流可能归因于BTO耗尽区中光生电子的存在。BTO表现出诸如长载流子扩散长度和低复合率等特性,有助于减少光电探测器内的载流子复合,从而可以显著提高MoS/BTO/p-Si异质结的光电流。MoS/BTO/p-Si结以更高的响应度和探测率为特征的增强性能,突出了这种异质结在先进光电探测应用中的潜力,为光电探测器领域的进一步研究和开发指明了有前景的途径。与现有文献的比较研究表明,目前研究的MoS/BTO/p-Si异质结约603 A/W的优异响应度和约10 Jones的探测率对于各种未来器件应用似乎非常有前景。