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由一氧化氮氧化甲醇的从头算化学动力学:主要产物形成机制的阐明及其与对流层化学的相关性。

Ab Initio Chemical Kinetics for Oxidation of CHOH by NO: Elucidation of the Mechanism for Major Product Formation and Its Relevancy to Tropospheric Chemistry.

作者信息

Trac Hue-Phuong, Lin Ming-Chang

机构信息

Department of Applied Chemistry, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.

出版信息

J Phys Chem A. 2024 Jul 18;128(28):5548-5555. doi: 10.1021/acs.jpca.4c02433. Epub 2024 Jul 8.

Abstract

Next to CH, CHOH is the most abundant C organics in the troposphere. The redox reaction of CHOH with NO had been shown experimentally to produce CHONO, instead of CHONO. The mechanism for the reaction remains unknown to date. We have investigated the reaction by ab initio MO calculations at the UCCSD(T)/6-311+G(3df,2p)//UB3LYP/6-311+G(3df,2p) level. The result indicates that the reaction takes place primarily by the isomerization of NO to ONONO through a very loose transition state within the NO-CHOH collision complex with a 14.3 kcal/mol barrier, followed by the rapid attack of ONONO at CHOH producing CHONO and HNO. The predicted mechanism for the redox reaction compares closely with the hydrolysis of NO. The computed rate constant, = 1.43 × 10 T exp (-9092/T) (200-2000 K) cmmolecules, for the formation of CHONO and HNO agrees reasonably with available low-temperature kinetic data and is found to be similar to that of the isoelectronic NO + CHNH reaction. We have also estimated the kinetics for the termolecular reaction, 2 NO + CHOH, and compared it with the direct bimolecular process; the latter was found to be 4.4 × 10 times faster under the troposphere condition. On the basis of the known pollution levels of NO, NO, and CHOH, both processes were estimated to be of negligible importance to tropospheric chemistry, however.

摘要

仅次于CH,CHOH是对流层中含量第二丰富的含碳有机物。实验表明,CHOH与NO的氧化还原反应生成的是CHONO,而非CHONO。该反应的机理至今仍不明确。我们在UCCSD(T)/6 - 311 + G(3df,2p)//UB3LYP/6 - 311 + G(3df,2p)水平上通过从头算分子轨道计算研究了该反应。结果表明,反应主要通过NO在NO - CHOH碰撞复合物内经由一个非常松散的过渡态异构化为ONONO进行,势垒为14.3千卡/摩尔,随后ONONO迅速进攻CHOH生成CHONO和HNO。预测的氧化还原反应机理与NO的水解反应密切相关。计算得到的生成CHONO和HNO的速率常数k = 1.43 × 10T exp(-9092/T)(200 - 2000 K)厘米³/分子,与现有的低温动力学数据合理吻合,且发现与等电子体NO + CHNH反应的速率常数相似。我们还估算了三分子反应2NO + CHOH的动力学,并将其与直接双分子过程进行比较;结果发现,在对流层条件下,后者的反应速度快4.4 × 10倍。然而,根据已知的NO、NO和CHOH的污染水平,估计这两个过程对对流层化学的重要性都可忽略不计。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/643d/11264261/acff49d9babe/jp4c02433_0001.jpg

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