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超快界面电荷转移引发金-二氧化钛界面处的机械应力和热传输。

Ultrafast Interfacial Charge Transfer Initiates Mechanical Stress and Heat Transport at the Au-TiO Interface.

作者信息

Heo Jun, Segalina Alekos, Kim Doyeong, Ahn Doo-Sik, Oang Key Young, Park Sungjun, Kim Hyungjun, Ihee Hyotcherl

机构信息

Center for Advanced Reaction Dynamics (CARD), Institute for Basic Science (IBS), Daejeon, 34141, Republic of Korea.

Radiation Center for Ultrafast Science, Korea Atomic Energy Research Institute (KAERI), Daejeon, 34057, Republic of Korea.

出版信息

Adv Sci (Weinh). 2024 Sep;11(34):e2400919. doi: 10.1002/advs.202400919. Epub 2024 Jul 8.

Abstract

Metal-semiconductor interfaces are crucial components of optoelectronic and electrical devices, the performance of which hinges on intricate dynamics involving charge transport and mechanical interaction at the interface. Nevertheless, structural changes upon photoexcitation and subsequent carrier transportation at the interface, which crucially impact hot carrier stability and lifetime, remain elusive. To address this long-standing problem, they investigated the electron dynamics and resulting structural changes at the Au/TiO interface using ultrafast electron diffraction (UED). The analysis of the UED data reveals that interlayer electron transfer from metal to semiconductor generates a strong coupling between the two layers, offering a new way for ultrafast heat transfer through the interface and leading to a coherent structural vibration that plays a critical role in propagating mechanical stress. These findings provide insights into the relationship between electron transfer and interfacial mechanical and thermal properties.

摘要

金属-半导体界面是光电器件和电气设备的关键组成部分,其性能取决于界面处涉及电荷传输和机械相互作用的复杂动力学。然而,光激发后界面处的结构变化以及随后的载流子传输,对热载流子的稳定性和寿命有着至关重要的影响,目前仍不清楚。为了解决这个长期存在的问题,他们使用超快电子衍射(UED)研究了Au/TiO界面处的电子动力学以及由此产生的结构变化。对UED数据的分析表明,从金属到半导体的层间电子转移在两层之间产生了强耦合,为通过界面的超快热传递提供了一种新途径,并导致了一种相干结构振动,这种振动在传播机械应力中起着关键作用。这些发现为电子转移与界面机械和热性能之间的关系提供了见解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/257d/11425853/6fa6383b7577/ADVS-11-2400919-g005.jpg

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