Park Jin Young, Moon Min Soo, Lee Heewoo, Kim Dongil, Park Hajung, Kim Jae Woo, Ko Hayoung, Ha Taewoo, Kim Jeongwoo, Bahk Young-Mi, Moon Byoung Hee, Kim Ki Kang, Park Seung Ryong, Choi Soobong, Sebait Riya, Kim Jung Ho, Lee Young Hee, Han Gang Hee
Department of Physics, Incheon National University (INU), Incheon 22012, Korea.
Center for Integrated Nanostructure Physics (CINAP), Institute for Basic Science (IBS), Suwon 16419, Korea.
ACS Nano. 2024 Jul 23;18(29):18992-19002. doi: 10.1021/acsnano.4c02662. Epub 2024 Jul 11.
Use of a template triggers an epitaxial interaction with the depositing material during synthesis. Recent studies have demonstrated that two-dimensional tellurium (tellurene) can be directionally oriented when grown on transition metal dichalcogenide (TMD) templates. Specifically, employing a T-phase TMD, such as WTe, restricts the growth direction even further due to its anisotropic nature, which allows for the synthesis of well-oriented tellurene films. Despite this, producing large-area epitaxial films still remains a significant challenge. Here, we report the continuous synthesis of a 1T'-MoTe template via chemical vapor deposition and tellurene via vapor transport. The interaction between helical Te and the 1T'-MoTe template facilitates the Te chains to collapse into ribbon shapes, enhancing lateral growth at a rate approximately 6 times higher than in the vertical direction, as confirmed by scanning electron microscopy and atomic force microscopy. Interestingly, despite the predominance of the lateral growth, cross-sectional transmission electron microscopy analysis of the tellurene ribbons revealed a consistent 60-degree incline at the edges. This suggests that the edges of the tellurene ribbons, where they contact the template surface, are favorable sites for additional Te absorption, which then stacks along the incline angle to expand. Furthermore, controlling the synthesis temperature, duration, and preheating time has facilitated the successful synthesis of tellurene films. The resultant tellurene exhibited hole mobility as high as ∼400 cm/V s. After removing the underlying metallic template with plasma treatment, the film showed a current on/off ratio of ∼10. This ratio was confirmed by two-terminal field-effect transistor measurements and supported by near-field terahertz (THz) spectroscopy mapping.
在合成过程中,使用模板会引发与沉积材料的外延相互作用。最近的研究表明,二维碲(碲烯)在过渡金属二硫属化物(TMD)模板上生长时可以定向排列。具体而言,采用T相TMD,如WTe,由于其各向异性,会进一步限制生长方向,从而能够合成取向良好的碲烯薄膜。尽管如此,制备大面积外延薄膜仍然是一项重大挑战。在此,我们报告了通过化学气相沉积连续合成1T'-MoTe模板以及通过气相输运合成碲烯的过程。螺旋状碲与1T'-MoTe模板之间的相互作用促使碲链坍缩成带状,扫描电子显微镜和原子力显微镜证实,其横向生长速率比垂直方向高出约6倍。有趣的是,尽管横向生长占主导,但对碲烯带的横截面透射电子显微镜分析显示,其边缘处存在一致的60度倾斜。这表明碲烯带与模板表面接触的边缘是额外碲吸收的有利位点,然后碲沿着倾斜角堆叠以扩展。此外,控制合成温度、持续时间和预热时间有助于成功合成碲烯薄膜。所得碲烯表现出高达约400 cm²/V·s的空穴迁移率。用等离子体处理去除下层金属模板后,薄膜的电流开/关比约为10。该比值通过两端场效应晶体管测量得到证实,并得到近场太赫兹(THz)光谱映射的支持。