Lin Tien-Chai, Wu Jyun-Yan, Mendez Andres Joseph John, Salazar Nadir, Hsu Hao-Lin, Huang Wen-Chang
Department of Electrical Engineering, Kun Shan University, No.195, Kunda Rd., Yongkang Dist., Tainan City 710303, Taiwan.
Department of Mechanical Engineering, Kun Shan University, No.195, Kunda Rd., Yongkang Dist., Tainan City 710303, Taiwan.
Materials (Basel). 2024 Jul 25;17(15):3677. doi: 10.3390/ma17153677.
This research introduces a hydrogen sensor made from a thin film of magnesium zinc oxide (MgZnO) deposited using a technique called radiofrequency co-sputtering (RF co-sputtering). Separate magnesium oxide (MgO) and zinc oxide (ZnO) targets were used to deposit the MgZnO film, experimenting with different deposition times and power levels. The sensor performed best (reaching a sensing response of 2.46) when exposed to hydrogen at a concentration of 1000 parts per million (ppm). This peak performance occurred with a MgZnO film thickness of 432 nanometers (nm) at a temperature of 300 °C. Initially, the sensor's responsiveness increased as the film thickness grew. This is because thicker films tend to have more oxygen vacancies, which are imperfections that play a role in the sensor's function. However, further increases in film thickness beyond the optimal point harmed performance. This is attributed to the growth of grains within the film, which hindered its effectiveness. X-ray diffraction (XRD) and field-emission scanning electron microscopy (FE-SEM) were employed to thoroughly characterize the quality of the MgZnO thin film. These techniques provided valuable insights into the film's crystal structure and morphology, crucial factors influencing its performance as a hydrogen sensor.
本研究介绍了一种由使用射频共溅射(RF共溅射)技术沉积的氧化镁锌(MgZnO)薄膜制成的氢传感器。使用单独的氧化镁(MgO)和氧化锌(ZnO)靶材来沉积MgZnO薄膜,并对不同的沉积时间和功率水平进行了实验。当暴露于浓度为百万分之一千(ppm)的氢气中时,该传感器表现最佳(传感响应达到2.46)。这种峰值性能出现在MgZnO薄膜厚度为432纳米(nm)、温度为300°C时。最初,随着薄膜厚度的增加,传感器的响应性增强。这是因为较厚的薄膜往往有更多的氧空位,这些缺陷在传感器的功能中发挥作用。然而,薄膜厚度超过最佳点后的进一步增加会损害性能。这归因于薄膜内晶粒的生长,这阻碍了其有效性。采用X射线衍射(XRD)和场发射扫描电子显微镜(FE-SEM)对MgZnO薄膜的质量进行了全面表征。这些技术为薄膜的晶体结构和形态提供了有价值的见解,而晶体结构和形态是影响其作为氢传感器性能的关键因素。