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过渡金属二硫属化物的大面积外延生长

Large-Area Epitaxial Growth of Transition Metal Dichalcogenides.

作者信息

Xue Guodong, Qin Biao, Ma Chaojie, Yin Peng, Liu Can, Liu Kaihui

机构信息

State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing 100871, China.

Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China.

出版信息

Chem Rev. 2024 Sep 11;124(17):9785-9865. doi: 10.1021/acs.chemrev.3c00851. Epub 2024 Aug 12.

DOI:10.1021/acs.chemrev.3c00851
PMID:39132950
Abstract

Over the past decade, research on atomically thin two-dimensional (2D) transition metal dichalcogenides (TMDs) has expanded rapidly due to their unique properties such as high carrier mobility, significant excitonic effects, and strong spin-orbit couplings. Considerable attention from both scientific and industrial communities has fully fueled the exploration of TMDs toward practical applications. Proposed scenarios, such as ultrascaled transistors, on-chip photonics, flexible optoelectronics, and efficient electrocatalysis, critically depend on the scalable production of large-area TMD films. Correspondingly, substantial efforts have been devoted to refining the synthesizing methodology of 2D TMDs, which brought the field to a stage that necessitates a comprehensive summary. In this Review, we give a systematic overview of the basic designs and significant advancements in large-area epitaxial growth of TMDs. We first sketch out their fundamental structures and diverse properties. Subsequent discussion encompasses the state-of-the-art wafer-scale production designs, single-crystal epitaxial strategies, and techniques for structure modification and postprocessing. Additionally, we highlight the future directions for application-driven material fabrication and persistent challenges, aiming to inspire ongoing exploration along a revolution in the modern semiconductor industry.

摘要

在过去十年中,对原子级薄的二维(2D)过渡金属二硫属化物(TMD)的研究迅速扩展,这归因于它们的独特性质,如高载流子迁移率、显著的激子效应和强自旋轨道耦合。科学界和工业界的广泛关注充分推动了对TMD实际应用的探索。诸如超大规模晶体管、片上光子学、柔性光电子学和高效电催化等设想方案,严重依赖于大面积TMD薄膜的可扩展生产。相应地,人们已投入大量努力来完善二维TMD的合成方法,这使该领域发展到需要全面总结的阶段。在本综述中,我们对TMD大面积外延生长的基本设计和重大进展进行了系统概述。我们首先概述它们的基本结构和多样性质。随后的讨论涵盖了最先进的晶圆级生产设计、单晶外延策略以及结构修饰和后处理技术。此外,我们强调了应用驱动的材料制造的未来方向和持续面临的挑战,旨在激发沿着现代半导体行业一场革命的持续探索。

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