Wang Guili, Gong Pifu, Yao Jiyong
Beijing Center for Crystal Research and Development, Key Lab of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China.
Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, P. R. China.
Inorg Chem. 2024 Sep 9;63(36):16834-16841. doi: 10.1021/acs.inorgchem.4c02602. Epub 2024 Aug 26.
A new quaternary Hg-based selenide KHgGeSe was successfully synthesized and characterized as an engaging infrared (IR) nonlinear optical (NLO) material, which crystallizes in the 2 space group of the noncentrosymmetric monoclinic crystal system. The crystal structure of KHgGeSe is characterized by the stacking of countless layers with K cations filling the interlayers. The UV-vis-NIR diffuse reflectance spectrum shows that KHgGeSe possesses an indirect band gap of 2.13 eV. The second harmonic generation (SHG) response of KHgGeSe is approximately 1.1 times that of AgGaS (AGS) within the particle size of 20-50 μm along with a nonphase-matching (NPM) behavior at 2090 nm, as indicated by the SHG test. KHgGeSe also has a large powder laser-induced damage threshold (∼ 2.3 × AGS). As revealed by theoretical calculations, the optical properties of KHgGeSe are predominantly determined by [HgSe] and [GeSe] tetrahedra, and KHgGeSe possesses a calculated optical band gap of 1.44 eV together with a maximum SHG coefficient of -7.70 pm V.
一种新型的基于汞的四元硒化物KHgGeSe成功合成,并被表征为一种引人关注的红外(IR)非线性光学(NLO)材料,它结晶于非中心对称单斜晶体系统的2空间群。KHgGeSe的晶体结构特征是由无数层堆叠而成,钾阳离子填充在层间。紫外-可见-近红外漫反射光谱表明,KHgGeSe具有2.13 eV的间接带隙。二次谐波产生(SHG)测试表明,在20-50μm粒径范围内,KHgGeSe的SHG响应约为AgGaS(AGS)的1.1倍,并且在2090 nm处呈现非相位匹配(NPM)行为。KHgGeSe还具有较大的粉末激光诱导损伤阈值(约为AGS的2.3倍)。理论计算表明,KHgGeSe的光学性质主要由[HgSe]和[GeSe]四面体决定,并且KHgGeSe的计算光学带隙为1.44 eV,最大SHG系数为-7.70 pm V。