Mladenović Ivana O, Nikolić Nebojša D, Jovanov Vladislav, Radovanović Željko M, Obradov Marko M, Vasiljević-Radović Dana G, Vuksanović Marija M
Institute of Chemistry, Technology and Metallurgy, University of Belgrade, Njegoševa 12, 11 000 Belgrade, Serbia.
Innovation Centre of Faculty of Technology and Metallurgy doo, Karnegijeva 4, 11 000 Belgrade, Serbia.
Materials (Basel). 2024 Aug 21;17(16):4138. doi: 10.3390/ma17164138.
Lab-made biosilica (SiO) nanoparticles were obtained from waste biomass (rice husks) and used as eco-friendly fillers in the production of nickel matrix composite films via the co-electrodeposition technique. The produced biosilica nanoparticles were characterized using XRD, FTIR, and FE-SEM/EDS. Amorphous nano-sized biosilica particles with a high SiO content were obtained. Various current regimes of electrodeposition, such as direct current (DC), pulsating current (PC), and reversing current (RC) regimes, were applied for the fabrication of Ni and Ni/SiO films from a sulfamate electrolyte. Ni films electrodeposited with or without 1.0 wt.% biosilica nanoparticles in the electrolyte were characterized using FE-SEM/EDS (morphology/elemental analyses, roundness), AFM (roughness), Vickers microindentation (microhardness), and sheet resistance. Due to the incorporation of SiO nanoparticles, the Ni/SiO films were coarser than those obtained from the pure sulfamate electrolyte. The addition of SiO to the sulfamate electrolyte also caused an increase in the roughness and electrical conductivity of the Ni films. The surface roughness values of the Ni/SiO films were approximately 44.0%, 48.8%, and 68.3% larger than those obtained for the pure Ni films produced using the DC, PC, and RC regimes, respectively. The microhardness of the Ni and Ni/SiO films was assessed using the Chen-Gao (C-G) composite hardness model, and it was shown that the obtained Ni/SiO films had a higher hardness than the pure Ni films. Depending on the applied electrodeposition regime, the hardness of the Ni films increased from 29.1% for the Ni/SiO films obtained using the PC regime to 95.5% for those obtained using the RC regime, reaching the maximal value of 6.880 GPa for the Ni/SiO films produced using the RC regime.
实验室制备的生物二氧化硅（SiO）纳米颗粒是从废弃生物质（稻壳）中获得的，并通过共电沉积技术用作镍基复合膜生产中的环保填料。使用X射线衍射（XRD）、傅里叶变换红外光谱（FTIR）和场发射扫描电子显微镜/能谱仪（FE-SEM/EDS）对制备的生物二氧化硅纳米颗粒进行了表征。获得了具有高SiO含量的非晶态纳米级生物二氧化硅颗粒。采用各种电沉积电流模式，如直流（DC）、脉动电流（PC）和反向电流（RC）模式，从氨基磺酸盐电解液中制备镍和镍/二氧化硅薄膜。使用FE-SEM/EDS（形貌/元素分析、圆度）、原子力显微镜（AFM）（粗糙度）、维氏显微压痕（显微硬度）和薄层电阻对在电解液中添加或不添加1.0 wt.%生物二氧化硅纳米颗粒电沉积的镍膜进行了表征。由于二氧化硅纳米颗粒的加入，镍/二氧化硅薄膜比从纯氨基磺酸盐电解液中获得的薄膜更粗糙。向氨基磺酸盐电解液中添加二氧化硅也导致镍膜的粗糙度和电导率增加。镍/二氧化硅薄膜的表面粗糙度值分别比使用直流、脉动电流和反向电流模式制备的纯镍薄膜的表面粗糙度值大约大44.0%、48.8%和68.3%。使用陈-高（C-G）复合硬度模型评估了镍和镍/二氧化硅薄膜的显微硬度，结果表明，获得的镍/二氧化硅薄膜比纯镍薄膜具有更高的硬度。根据所采用的电沉积模式，镍膜的硬度从使用脉动电流模式获得的镍/二氧化硅薄膜的29.1%增加到使用反向电流模式获得的镍/二氧化硅薄膜的95.5%，使用反向电流模式制备的镍/二氧化硅薄膜达到最大值6.880 GPa。
