Bruque Maria G, Rodger Alison, Hoffmann Søren Vrønning, Jones Nykola C, Aucamp Jean, Dafforn Tim R, Thomas Owen R T
School of Chemical Engineering, University of Birmingham, Edgbaston B15 2TT, U.K.
School of Biosciences, University of Birmingham, Edgbaston B15 2TT, U.K.
Anal Chem. 2024 Sep 10;96(38):15151-9. doi: 10.1021/acs.analchem.4c01882.
Understanding the impact of the manufacturing environment on therapeutic monoclonal antibody (mAb) structures requires new process analytical technology. Here, we describe the creation of a new reference set for the circular dichroism (CD) spectra of mAbs. Data sets of the highest quality were collected by synchrotron radiation CD for 14 different mAbs in both native and acid-stressed states. Deconvolution of far-UV spectra for the mAb cohort identified two current reference sets (SP175 and SMP180) as assigning accurate secondary structures, irrespective of the analysis program employed. Scrutiny of spectra revealed significant variation in the far-UV and especially near-UV CD of the 14 mAbs. Two spectral features were found to be sensitive to changes in solution pH, i.e., the far-UV positive peak at 201-202 nm and the near-UV negative exciton couplet around 230-240 nm. The latter feature offers attractive possibilities for in-line CD-based monitoring of the mAb structure during manufacture.
了解制造环境对治疗性单克隆抗体(mAb)结构的影响需要新的过程分析技术。在此,我们描述了一个针对mAb圆二色性(CD)光谱的新参考集的创建。通过同步辐射CD收集了14种不同mAb在天然状态和酸应激状态下的高质量数据集。对mAb队列的远紫外光谱进行去卷积分析后发现,有两个当前参考集(SP175和SMP180)能够准确指定二级结构,无论采用何种分析程序。对光谱的仔细研究揭示了这14种mAb在远紫外尤其是近紫外CD方面存在显著差异。发现有两个光谱特征对溶液pH值的变化敏感,即201 - 202 nm处的远紫外正峰和230 - 240 nm附近的近紫外负激子偶合峰。后一个特征为在制造过程中基于CD的mAb结构在线监测提供了诱人的可能性。