Moon Ji-Yun, Bae Sang-Hoon, Lee Jae-Hyun
Mechanical Engineering and Materials Science, Washington University in St. Louis, St. Louis, Missouri 63130, United States.
Institute of Materials Science and Engineering, Washington University in St. Louis, St. Louis, Missouri 63130, United States.
Acc Chem Res. 2024 Oct 1;57(19):2826-2835. doi: 10.1021/acs.accounts.4c00425. Epub 2024 Sep 12.
ConspectusThe vertical integration of van der Waals nanomembranes (vdW NMs), composed of two-dimensional (2D) layered materials and three-dimensional (3D) freestanding films with vdW surfaces, opens new avenues for exploring novel physical phenomena and offers a promising pathway for prototyping ultrathin, superior-performance electronic and optoelectronic applications with unique functionalities. Achieving the desired functionality through vdW integration necessitates the production of high-quality individual vdW NMs, which is a fundamental prerequisite. A profound understanding of the synthetic strategies for vdW NMs, along with their fundamental working principles, is crucial in guiding the experimental design toward 3D integrated heterostructures. The foremost synthetic challenges in fabricating high-quality vdW NMs are achieving exact control over thickness and ensuring surface planarity on the atomic scale. Despite the development of numerous chemical and mechanical approaches to tackle these issues, an all-encompassing solution has yet to be realized. To address these challenges, we have developed advanced spalling techniques, specifically known as atomic spalling or 2D material-based layer transfer, which emerge as a promising technology for achieving both atomically precise thickness-engineered and atomically smooth vdW NMs. These techniques involve engineering the interfacial fracture toughness and strain energy in the vdW system, allowing for precise control over the initiation and the propagation of cracks within the vdW material based on controlled spalling theory.In this Account, we summarize our recent advancements in the atomic precision spalling technique for the preparation of vdW NMs and their applications. We begin by introducing the fundamentals of advanced spalling techniques, which are based on spalling mode fracture in bilayer systems. Following this, we succinctly describe the preparation methods for source materials for vdW NMs, with a primary focus on chemical synthesis approaches. We then delve into the working principles underlying our recent contributions to advanced spalling techniques, providing insights into how this method attains unprecedented atomic-precision control compared to other fabrication methods with a particular emphasis on tuning the interface between the stressor and the vdW system. Subsequently, we highlight cutting-edge applications based on vdW heterostructures, which combine our spalled vdW NMs. Finally, we discuss the current challenges and future directions for advanced spalling techniques, underscoring their potential to be established as a robust methodology for the preparation of high-quality vdW NMs. Our advanced spalling strategy not only ensures the reliable production of vdW NMs with exceptional control over thickness and atomic-level flatness but also provides a robust theoretical framework essential for producing high-quality vdW NMs.
综述
由二维(2D)层状材料和具有范德华表面的三维(3D)独立薄膜组成的范德华纳米膜(vdW NMs)的垂直集成,为探索新的物理现象开辟了新途径,并为具有独特功能的超薄、高性能电子和光电子应用原型提供了一条有前景的途径。通过范德华集成实现所需功能需要生产高质量的单个范德华纳米膜,这是一个基本前提。深入了解范德华纳米膜的合成策略及其基本工作原理,对于指导三维集成异质结构的实验设计至关重要。制造高质量范德华纳米膜面临的首要合成挑战是实现对厚度的精确控制,并确保原子尺度上的表面平整度。尽管已经开发了许多化学和机械方法来解决这些问题,但尚未找到一个全面的解决方案。为了应对这些挑战,我们开发了先进的剥落技术,特别是原子剥落或基于二维材料的层转移技术,这是一种很有前景的技术,可用于制备原子精确厚度设计且原子级光滑的范德华纳米膜。这些技术涉及调控范德华系统中的界面断裂韧性和应变能,从而基于可控剥落理论精确控制范德华材料内部裂纹的萌生和扩展。
在本综述中,我们总结了用于制备范德华纳米膜及其应用的原子精确剥落技术的最新进展。我们首先介绍基于双层系统中剥落模式断裂的先进剥落技术的基本原理。在此之后,我们简要描述范德华纳米膜源材料的制备方法,主要侧重于化学合成方法。然后,我们深入探讨我们对先进剥落技术的最新贡献背后的工作原理,深入了解与其他制造方法相比,该方法如何实现前所未有的原子精确控制,特别强调调控应力源与范德华系统之间的界面。随后,我们重点介绍基于范德华异质结构的前沿应用,这些异质结构结合了我们剥落的范德华纳米膜。最后,我们讨论先进剥落技术当前面临的挑战和未来发展方向,强调其作为制备高质量范德华纳米膜的可靠方法的潜力。我们的先进剥落策略不仅确保可靠地生产出对厚度和原子级平整度具有出色控制的范德华纳米膜,还提供了生产高质量范德华纳米膜必不可少的强大理论框架。