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用于电子闪光放射治疗中参考剂量测定的新型电离室的研制。

Development of novel ionization chambers for reference dosimetry in electron flash radiotherapy.

作者信息

Liu Kevin, Holmes Shannon, Khan Ahtesham Ullah, Hooten Brian, DeWerd Larry, Schüler Emil, Beddar Sam

机构信息

Department of Radiation Physics, Division of Radiation Oncology, The University of Texas MD Anderson Cancer Center, Houston, Texas, USA.

The University of Texas MD Anderson Cancer Center UTHealth Houston Graduate School of Biomedical Sciences, Houston, Texas, USA.

出版信息

Med Phys. 2024 Dec;51(12):9275-9289. doi: 10.1002/mp.17425. Epub 2024 Sep 23.

Abstract

BACKGROUND

Reference dosimetry in ultra-high dose rate (UHDR) beamlines is significantly hindered by limitations in conventional ionization chamber design. In particular, conventional chambers suffer from severe charge collection efficiency (CCE) degradation in high dose per pulse (DPP) beams.

PURPOSE

The aim of this study was to optimize the design and performance of parallel plate ion chambers for use in UHDR dosimetry applications, and evaluate their potential as reference class chambers for calibration purposes. Three chamber designs were produced to determine the influence of the ion chamber response on electrode separation, field strength, and collection volume on the ion chamber response under UHDR and ultra-high dose per pulse (UHDPP) conditions.

METHODS

Three chambers were designed and produced: the A11-VAR (0.2-1.0 mm electrode gap, 20 mm diameter collector), the A11-TPP (0.3 mm electrode gap, 20 mm diameter collector), and the A30 (0.3 mm electrode gap, 5.4 mm diameter collector). The chambers underwent full characterization using an UHDR 9 MeV electron beam with individually varied beam parameters of pulse repetition frequency (PRF, 10-120 Hz), pulse width (PW, 0.5-4 µs), and pulse amplitude (0.01-9 Gy/pulse). The response of the ion chambers was evaluated as a function of the DPP, PRF, PW, dose rate, electric field strength, and electrode gap.

RESULTS

The chamber response was found to be dependent on DPP and PW, and these dependencies were mitigated with larger electric field strengths and smaller electrode spacing. At a constant electric field strength, we measured a larger CCE as a function of DPP for ion chambers with a smaller electrode gap in the A11-VAR. For ion chambers with identical electrode gap (A11-TPP and A30), higher electric field strengths were found to yield better CCE at higher DPP. A PW dependence was observed at low electric field strengths (500 V/mm) for DPP values ranging from 1 to 5 Gy at PWs ranging from 0.5 to 4 µs, but at electric field strengths of 1000 V/mm and higher, these effects become negligible.

CONCLUSION

This study confirmed that the CCE of ion chambers depends strongly on the electrode spacing and the electric field strength, and also on the DPP and the PW of the UHDR beam. A significant finding of this study is that although chamber performance does depend on PW, the effect on the CCE becomes negligible with reduced electrode spacing and increased electric field. A CCE of ≥95% was achieved for DPPs of up to 5 Gy with no observable dependence on PW using the A30 chamber, while still achieving an acceptable performance in conventional dose rate beams, opening up the possibility for this type of chamber to be used as a reference class chamber for calibration purposes of electron FLASH beamlines.

摘要

背景

传统电离室设计的局限性严重阻碍了超高剂量率(UHDR)束流线上的参考剂量测定。特别是,传统电离室在高单脉冲剂量(DPP)束流中存在严重的电荷收集效率(CCE)下降问题。

目的

本研究的目的是优化平行板电离室的设计和性能,以用于UHDR剂量测定应用,并评估其作为校准用参考级电离室的潜力。制作了三种电离室设计,以确定在UHDR和超高单脉冲剂量(UHDPP)条件下,电离室响应随电极间距、场强和收集体积对电离室响应的影响。

方法

设计并制作了三个电离室:A11-VAR(电极间隙0.2 - 1.0毫米,收集器直径20毫米)、A11-TPP(电极间隙0.3毫米,收集器直径20毫米)和A30(电极间隙0.3毫米,收集器直径5.4毫米)。使用UHDR 9兆电子伏电子束对这些电离室进行全面表征,电子束的脉冲重复频率(PRF,10 - 120赫兹)、脉冲宽度(PW,0.5 - 4微秒)和脉冲幅度(0.01 - 9戈瑞/脉冲)等束流参数单独变化。评估电离室的响应随DPP、PRF、PW、剂量率、电场强度和电极间隙的变化情况。

结果

发现电离室响应取决于DPP和PW,并且随着电场强度增大和电极间距减小,这些依赖性会减弱。在恒定电场强度下,对于A11-VAR中电极间隙较小的电离室,我们测量到CCE随DPP的变化更大。对于电极间隙相同的电离室(A11-TPP和A30),发现在较高DPP时,更高的电场强度会产生更好的CCE。在低电场强度(500伏/毫米)下,当PW在0.5至4微秒范围内,DPP值在1至5戈瑞之间时,观察到了PW依赖性,但在电场强度为1000伏/毫米及更高时,这些影响可忽略不计。

结论

本研究证实,电离室的CCE强烈依赖于电极间距和电场强度,也依赖于UHDR束流的DPP和PW。本研究的一个重要发现是,尽管电离室性能确实依赖于PW,但随着电极间距减小和电场增加,对CCE的影响可忽略不计。使用A30电离室,对于高达5戈瑞的DPP,实现了≥95%的CCE,且未观察到对PW的依赖性,同时在传统剂量率束流中仍具有可接受性能,这为这种类型的电离室用作电子FLASH束流线校准用参考级电离室开辟了可能性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/505f/11659051/b8ded0432703/nihms-2024379-f0001.jpg

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