Suppr超能文献

具有均匀层堆叠、高载流子迁移率和可调节边缘形态的单晶GeSe范德华带

Single Crystalline GeSe Van Der Waals Ribbons With Uniform Layer Stacking, High Carrier Mobility, and Adjustable Edge Morphology.

作者信息

Sutter Eli, Kisslinger Kim, Wu Lijun, Zhu Yimei, Yang Seunghoon, Camino Fernando, Nam Chang-Yong, Sutter Peter

机构信息

Department of Mechanical and Materials Engineering, University of Nebraska-Lincoln, Lincoln, NE, 68588, USA.

Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, 68588, USA.

出版信息

Small. 2024 Dec;20(50):e2406129. doi: 10.1002/smll.202406129. Epub 2024 Sep 27.

Abstract

Performance of the group IV monochalcogenide GeSe in solar cells, electronic, and optoelectronic devices is expected to improve when high-quality single crystalline material is used rather than polycrystalline films. Crystalline flakes represent an attractive alternative to bulk single crystals as their synthesis may be developed to be scalable, faster, and with higher overall yield. However, large - and especially large and thin - single crystal flakes are notoriously hard to synthesize. Here it is demonstrated that vapor-liquid-solid growth combined with direct lateral vapor-solid incorporation produces high-quality single crystalline GeSe ribbons with tens of micrometers size and controllable thickness. Electron microscopy shows that the ribbons exhibit perfect equilibrium (AB) van der Waals stacking order without extended defects across the entire thickness, in contrast to the conventional case of substrate-supported flakes where material is added via layer-by-layer nucleation and growth on the basal plane. Electrical measurements show anisotropic transport and a high Hall mobility of 85 cm V s, on par with the best single crystals to date. Growth from mixed GeSe and SnSe vapors, finally, yields ribbons with unchanged structure and composition but with jagged edges, promising for applications that rely on ample chemically active edge sites, such as catalysis or photocatalysis.

摘要

当使用高质量的单晶材料而非多晶薄膜时,预计IV族单硫属化物GeSe在太阳能电池、电子和光电器件中的性能会得到改善。晶体薄片是块状单晶的一种有吸引力的替代物,因为它们的合成可以发展为可扩展、更快且总产率更高。然而,众所周知,大尺寸的单晶薄片,尤其是大尺寸且薄的单晶薄片很难合成。在此证明,气-液-固生长与直接横向气-固结合相结合可产生尺寸达数十微米且厚度可控的高质量单晶GeSe带。电子显微镜显示,与通过在基面进行逐层成核和生长来添加材料的传统衬底支撑薄片情况相反,这些带在整个厚度上都呈现出完美的平衡(AB)范德华堆叠顺序,没有扩展缺陷。电学测量表明其具有各向异性传输,霍尔迁移率高达85 cm² V⁻¹ s⁻¹,与迄今为止最好的单晶相当。最后,从混合的GeSe和SnSe蒸气中生长得到的带具有不变的结构和成分,但边缘参差不齐,这对于依赖大量化学活性边缘位点的应用(如催化或光催化)很有前景。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/555f/11636071/72468265b6c7/SMLL-20-2406129-g003.jpg

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验