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用于动态核极化的多孔硅纳米颗粒的可控合成与表征

Controlled synthesis and characterization of porous silicon nanoparticles for dynamic nuclear polarization.

作者信息

von Witte Gevin, Himmler Aaron, Hyppönen Viivi, Jäntti Jiri, Albannay Mohammed M, Moilanen Jani O, Ernst Matthias, Lehto Vesa-Pekka, Riikonen Joakim, Kozerke Sebastian, Kettunen Mikko I, Tamarov Konstantin

机构信息

Institute for Biomedical Engineering, University and ETH Zurich, Zurich, Switzerland.

Institute of Molecular Physical Science, ETH Zurich, Zurich, Switzerland.

出版信息

Nanoscale. 2024 Oct 24;16(41):19385-19399. doi: 10.1039/d4nr02603a.

Abstract

Si nanoparticles (NPs) have been actively developed as a hyperpolarized magnetic resonance imaging (MRI) contrast agent with an imaging window close to one hour. However, the progress in the development of NPs has been hampered by the incomplete understanding of their structural properties that correspond to efficient hyperpolarization buildup and long polarization decays. In this work we study dynamic nuclear polarization (DNP) of single crystal porous Si (PSi) NPs with defined doping densities ranging from nominally undoped to highly doped with boron or phosphorus. To develop such PSi NPs we perform low-load metal-assisted catalytic etching for electronic grade Si powder followed by thermal oxidation to form the dangling bonds in the Si/SiO interface, the centers. centers are the endogenous source of the unpaired electron spins necessary for DNP. The controlled fabrication and oxidation procedures allow us to thoroughly investigate the impact of the magnetic field, temperature and doping on the DNP process. We argue that the buildup and decay rate constants are independent of size of Si crystals between approximately 10 and 60 nm. Instead, the rates are limited by the polarization transfer across the nuclear spin diffusion barrier determined by the large hyperfine shift of the central Si nuclei of the centers. The size-independent rates are then weakly affected by the doping degree for low and moderately doped Si although slight doping is required to achieve the highest polarization. Thus, we find the room temperature relaxation of low boron doped PSi NPs reaching 75 ± 3 minutes and nuclear polarization levels exceeding ∼6% when polarized at 6.7 T and 1.4 K. Our study thus establishes solid grounds for further development of Si NPs as hyperpolarized contrast agents.

摘要

硅纳米颗粒(NPs)已被积极开发为一种超极化磁共振成像(MRI)造影剂,其成像窗口接近一小时。然而,由于对其与高效超极化积累和长极化衰减相对应的结构特性缺乏全面了解,纳米颗粒的开发进展受到了阻碍。在这项工作中,我们研究了具有确定掺杂密度(从名义上未掺杂到硼或磷的高掺杂)的单晶多孔硅(PSi)纳米颗粒的动态核极化(DNP)。为了开发这种PSi纳米颗粒,我们对电子级硅粉进行低负载金属辅助催化蚀刻,然后进行热氧化,以在Si/SiO界面形成悬空键,即中心。这些中心是DNP所需未配对电子自旋的内源性来源。可控的制造和氧化程序使我们能够全面研究磁场、温度和掺杂对DNP过程的影响。我们认为,积累和衰减速率常数与大约10至60纳米之间的硅晶体尺寸无关。相反,速率受到由中心硅核的大超精细位移决定的核自旋扩散势垒上的极化转移的限制。对于低掺杂和中等掺杂的硅,与尺寸无关的速率随后受到掺杂程度的微弱影响,尽管需要轻微掺杂才能实现最高极化。因此,我们发现,当在6.7 T和1.4 K下极化时,低硼掺杂的PSi纳米颗粒在室温下的弛豫时间达到75±3分钟,核极化水平超过约6%。因此,我们的研究为进一步开发作为超极化造影剂的硅纳米颗粒奠定了坚实的基础。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d273/11430043/f126b03bc26d/d4nr02603a-f1.jpg

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