Yang Yawen, Wan Hanchi, Xing Qiang, Zhang Xiaoping, Xu Haili
School of Mechanical Engineering, Nantong University, Nantong 226019, China.
Materials (Basel). 2024 Sep 23;17(18):4650. doi: 10.3390/ma17184650.
The meniscus-confined electrodeposition (MCED) technique offers advantages such as low cost and wide applicability, making it a promising method in the field of micro/nanofabrication. However, unstable meniscal morphology and poor deposition quality during planar deposition in MCED necessitate the development of improved methods. Therefore, a planar adaptive micro-tuning deposition method (PAMTDM), which utilizes the positioning technology of scanning electrochemical cell microscopy (SECCM) and employs a singular value decomposition (SVD) planar fitting method to determine the flatness of the deposition plane, is proposed. An adaptive micro-tuning motion mode was proposed by analyzing the variation patterns of the meniscus. Moreover, a combination of multi-physics finite element simulations and orthogonal experimental methods was introduced to determine the optimal motion parameters. The experimental results demonstrate that the PAMTDM effectively addresses the issues encountered during planar growth. Compared to the point-by-point deposition method, the PAMTDM achieves a threefold increase in deposition speed for continuous deposition of 105-μm-long line segments in two-dimensional planes, with a deposition current error of less than 0.2 nA. In conclusion, the proposed method provides significant insights into the broad future applications of MCED.
半月板限制电沉积（MCED）技术具有成本低、适用性广等优点，使其成为微纳制造领域一种很有前景的方法。然而，MCED中平面沉积过程中半月板形态不稳定且沉积质量差，这就需要开发改进方法。因此，提出了一种平面自适应微调沉积方法（PAMTDM），该方法利用扫描电化学池显微镜（SECCM）的定位技术，并采用奇异值分解（SVD）平面拟合方法来确定沉积平面的平整度。通过分析半月板的变化模式，提出了一种自适应微调运动模式。此外，引入了多物理场有限元模拟和正交实验方法相结合的方式来确定最佳运动参数。实验结果表明，PAMTDM有效地解决了平面生长过程中遇到的问题。与逐点沉积方法相比，PAMTDM在二维平面上连续沉积105μm长的线段时，沉积速度提高了两倍，沉积电流误差小于0.2 nA。总之，所提出的方法为MCED在未来的广泛应用提供了重要的见解。
