Liu Qiong, Nanthakumar Srivilliputtur Subbiah, Li Bin, Cheng Teresa, Bittner Florian, Ma Chenxi, Ding Fei, Zheng Lei, Roth Bernhard, Zhuang Xiaoying
Faculty of Mathematics and Physics, Leibniz University Hannover, Hannover 30167, Germany.
Institute of Plastics and Circular Economy (IKK), Faculty of Mechanical Engineering, Leibniz University Hannover, Hannover 30823, Germany.
J Phys Chem C Nanomater Interfaces. 2024 Sep 12;128(38):16265-16273. doi: 10.1021/acs.jpcc.4c05690. eCollection 2024 Sep 26.
Low-dimensional van der Waals (vdW) three-dimensional (3D) topological insulators (TIs) have been overlooked, regarding their electromechanical properties. In this study, we experimentally investigate the electromechanical coupling of low-dimensional 3D TIs with a centrosymmetric crystal structure, where a binary compound, bismuth selenide (BiSe), is taken as an example. Piezoresponse force microscopy (PFM) results of BiSe nanoflakes show that the material exhibits both out-of-plane and in-plane electromechanical responses. With careful analyses, the electromechanical responses are verified to arise from the converse flexoelectricity. The BiSe nanoflakes have a decreasing effective out-of-plane piezoelectric coefficient with the thickness increasing, with the value of ∼0.65 pm V for the 37 nm-thick sample. The measured effective out-of-plane piezoelectric coefficient is mainly contributed by the flexoelectric coefficient, μ, which is estimated to be approximately 0.13 nC m. The results can help to understand the flexoelectricity of low-dimensional vdW TIs with centrosymmetric crystal structures, which is crucial for the design of nanoelectromechanical devices and spintronics built by vdW TIs.
低维范德华(vdW)三维(3D)拓扑绝缘体(TIs)的机电特性一直被忽视。在本研究中,我们通过实验研究了具有中心对称晶体结构的低维3D TIs的机电耦合,其中以二元化合物硒化铋(BiSe)为例。BiSe纳米片的压电力显微镜(PFM)结果表明,该材料表现出平面外和平面内的机电响应。经过仔细分析,证实机电响应源于逆挠曲电效应。BiSe纳米片的有效平面外压电系数随厚度增加而减小,对于37 nm厚的样品,该值约为0.65 pm V。测得的有效平面外压电系数主要由挠曲电系数μ贡献,估计约为0.13 nC m。这些结果有助于理解具有中心对称晶体结构的低维vdW TIs的挠曲电效应,这对于由vdW TIs构建的纳米机电器件和自旋电子学的设计至关重要。