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用于3D自选择存储器的非晶硫族化物中极性相关V位移的微观起源

Microscopic Origin of Polarity-Dependent V Shift in Amorphous Chalcogenides for 3D Self-Selecting Memory.

作者信息

Sung Ha-Jun, Choi Minwoo, Wu Zhe, Chae Hwasung, Heo Sung, Kang Youngjae, Koo Bonwon, Park Jong-Bong, Yang Wooyoung, Park Yongyoung, Ham Yongnam, Yang Kiyeon, Lee Chang Seung

机构信息

Thin Film Technical Unit, Samsung Advanced Institute of Technology, Samsung Electronics, Suwon-si, 16677, South Korea.

Advanced Process Development Team, Semiconductor R&D Center, Samsung Electronics, Hwaseong-si, 18448, South Korea.

出版信息

Adv Sci (Weinh). 2024 Nov;11(44):e2408028. doi: 10.1002/advs.202408028. Epub 2024 Oct 9.

Abstract

Ovonic threshold switching (OTS) selectors based on amorphous chalcogenides can revolutionize 3D memory technology owing to their self-selecting memory (SSM) behavior. However, the complex mechanism governing the memory writing operation limits compositional and device optimization. This study investigates the mechanism behind the polarity-dependent threshold voltage shift (ΔV) through theoretical and experimental analyses. By examining the physical principles of threshold switching and conducting defect state analysis, the ΔV as a memory window is confirmed to be attributed to the dynamics of charged defects and their gradient near electrodes, influenced by the nonuniform electric field after threshold switching. This study provides critical insights into the operational mechanism of OTS-based SSM, known as selector-only memory, highlighting its advantages for developing high-density, low-cost, and energy-efficient memory technologies in the artificial intelligence era.

摘要

基于非晶硫属化物的氧化钒阈值开关(OTS)选择器因其自选择存储(SSM)行为,有望彻底变革3D存储技术。然而,控制存储写入操作的复杂机制限制了成分和器件的优化。本研究通过理论和实验分析,探究了极性依赖阈值电压漂移(ΔV)背后的机制。通过研究阈值开关的物理原理并进行缺陷态分析,确认作为存储窗口的ΔV归因于带电缺陷的动力学及其在电极附近的梯度,这受到阈值开关后非均匀电场的影响。本研究为基于OTS的SSM(即仅选择器存储)的运行机制提供了关键见解,突出了其在人工智能时代开发高密度、低成本和节能存储技术方面的优势。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d93d/11600224/65c790b9f941/ADVS-11-2408028-g004.jpg

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